Demonstration of Parallel Scanning Probe Microscope for high throughput metrology and inspection

Autor: Sadeghian Marnani, H., Dekker, A., Herfst, R.W., Winters, J., Eigenraam, A.B.C., Rijnbeek, R.A., Nulkes, N.

Publikováno v: Cain, J.P.Sanchez, M.I., SPIE Advanced Lithography conference on Metrology, Inspection, and Process Control for Microlithography XXIX, 22-26 February 2015, San Jose, California, USA, 9424

With the device dimensions moving towards the 1X node and below, the semiconductor industry is rapidly approaching the point where existing metrology, inspection and review tools face huge challenges in terms of resolution, the ability to resolve 3D

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a5f383590215494f7ebbc0258e76e115
http://resolver.tudelft.nl/uuid:33268b1f-f7ec-406f-8777-abcd068f703a