Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Eeva-Liisa Lakomaa"'
Autor:
Arla Kytökivi, Marina Lindblad, Tuomo Suntola, Eeva-Liisa Lakomaa, Aimo Rautiainen, Suvi Haukka
Publikováno v:
Applied Surface Science. :286-291
Different supports were modified with titania, zirconia and chromia by the atomic layer epitaxy technique (ALE). In ALE, a metal precursor is bound to the support in saturating gas-solid reactions. Surface oxides are grown by alternating reactions of
Publikováno v:
Rosenberg, R, Zilliacus, R, Lakomaa, E-L, Rautiainen, A & Mäkelä, A 1996, ' Study of CdTe/CdS-thin films by isotope dilution, neutron activation analysis, inductively coupled plasma mass spectrometry and secondary ion mass spectrometry ', Fresenius' Journal of Analytical Chemistry, vol. 354, no. 1, pp. 6-10 . https://doi.org/10.1007/s002169600001
Thin polycrystalline CdTe films can be used as materials for solar cells. The CdTe surface is etched with H3PO4/HNO3 solution to remove soluble Cd compounds and to leave insoluble Te compounds on the surface and thus creating a layer between CdTe and
Publikováno v:
Langmuir. 12:4395-4403
The reaction of ZrCl4 vapor at 300, 450, and 600 °C with silica and γ-alumina preheated at 300 and 600 °C was studied by XRD, FTIR, 1H MAS NMR, and chemical etching with sulfuric acid. NMR and FTIR...
Publikováno v:
Analytical Chemistry. 67:1881-1886
An FT-IR spectrometer provided with software for multi component analysis of FR spectra was used for simultaneous determination of up to 12 hydrocarbons in a gaseous mixture. The hydrocarbons, ranging from methane to n-butane, were selected to simula
Publikováno v:
Applied Surface Science. :548-552
The work with single molecular layers on porous materials adds to the atomic level understanding of the film growth in ALE. In this paper the primary factors affecting the surface coverage of three different ALE precursors (TiCl4, Cr(acac)3 and hexam
Autor:
Eeva-Liisa Lakomaa
Publikováno v:
Applied Surface Science. 75:185-196
Atomic layer epitaxy (ALE), commonly used for growing single crystals and thin films, has been applied to process catalysts on porous high surface area substrates. Unlike many compound growth methods ALE growth is not controlled by the dose of the re
Publikováno v:
Applied Surface Science. 75:220-227
Atomic layer epitaxy (ALE) reactions (i.e. saturating gas-solid reactions) of chromium acetylacetonate (Cr(acac)3) at 200–280°C with silica preheated at 200–820°C were studied by determining chromium and carbon concentrations, recording FTIR sp
Publikováno v:
Langmuir. 9:3497-3506
Publikováno v:
The Journal of Physical Chemistry. 97:5085-5094
The atomic layer epitaxy (ALE) reactions, i.e., the saturating gas-solid reactions of TiCl 4 at 175 and 450 o C with silica preheated at 200-820 o C, were studied by nuclear magnetic resonance and Fourier transform infrared spectroscopy, while etchin
Publikováno v:
Thin Solid Films. 225:280-283
An extension of atomic layer epitaxy (ALE) to a porous, high-surface-area substrate commonly used in catalysis is presented. Because of the high surface area, even a sublayer of species bound to the substrate in an ALE sequence can be determined quan