Zobrazeno 1 - 10
of 74
pro vyhledávání: '"Eelco van Setten"'
Autor:
Andreas Frommhold, Joern-Holger Franke, Tatiana Kovalevich, Eelco van Setten, Vidya Vaenkatesan
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Autor:
Natalia V. Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura L. Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Autor:
Kaustuve Bhattacharyya, Rudy Peters, Greet Storms, Diederik de Bruin, Jara G. Santaclara, Rob van Ballegoij, Eelco van Setten, Teun van Gogh
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Eelco van Setten, Sofia Leitao, Claire van Lare, Jan van Schoot, Jo Finders, Kaustuve Bhattacharyya
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Natalia V. Davydova, Vincent Wiaux, Joost Bekaert, Frank J. Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen D. Hsu, Rene Carpaij
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Eelco van Setten, Claire van Lare, Tim Brunner, Mark van de Kerkhof, Andreas Erdmann
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Jo Finders, Claire van Lare, D.S. Nam, Par Broman, Eelco van Setten, Frank de Lange, Frank Timmermans
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Eelco van Setten, Gerardo Bottiglieri, Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Claire van Lare, Mark van de Kerkhof, Tim Brunner
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
We employ the hybrid mask model of the Fraunhofer IISB simulator Dr.LiTHO to investigate the role of the absorber and multilayer for the observed image blur and contrast loss mechanisms. Hybrid mask model decomposes the EUV mask into the absorber and
Autor:
Bartosz Bilski, Anton van Oosten, Paul Graeupner, Jan van Schoot, Claire van Lare, Joerg Zimmermann, Eelco van Setten, Friso Wittebrood, Jo Finders, Natalia Davydova, Gerardo Bottiglieri, John McNamara, Gijsbert Rispens
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
To enable cost-effective shrink of future devices, a new High-NA EUV platform is being developed. The High-NA EUV scanner employs a novel POB design concept with 0.55NA that enables 8nm HP resolution and a high throughput. In this paper we will discu
Autor:
Rudy Peeters, Eelco van Setten, Jo Finders, Judon Stoeldraijer, Peter Kuerz, Ruben Maas, Kars Zeger Troost, Thomas Stammler, Paul Graeupner, Sjoerd Lok, Jos Benschop, Jan van Schoot
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
While EUV systems equipped with a 0.33 Numerical Aperture (NA) lens are being applied in high volume manufacturing, ASML and ZEISS are in parallel ramping up their activities on an EUV exposure tool with an NA of 0.55. The purpose of this so-called h