Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Edwin Alexandru Laszlo"'
Autor:
Alina-Cristina Bunea, Violeta Dediu, Edwin Alexandru Laszlo, Florian Pistriţu, Mihaela Carp, Florina Silvia Iliescu, Octavian Narcis Ionescu, Ciprian Iliescu
Publikováno v:
Micromachines, Vol 12, Iss 9, p 1091 (2021)
Real-time “on-body” monitoring of human physiological signals through wearable systems developed on flexible substrates (e-skin) is the next target in human health control and prevention, while an alternative to bulky diagnostic devices routinely
Externí odkaz:
https://doaj.org/article/68604686515a43999b27770fa9de87c7
Autor:
Edwin Alexandru Laszlo, Doina Crăciun, Gabriela Dorcioman, Gabriel Crăciun, Victor Geantă, Ionelia Voiculescu, Daniel Cristea, Valentin Crăciun
Publikováno v:
Coatings; Volume 12; Issue 8; Pages: 1211
Starting from solid-solutions (SS) of AlCoCrFeNix high-entropy alloys (HEAs) that have been produced with high purity constituent elements by vacuum arc remelting (VAR) method varying the nickel molar ratio x from 0.2 to 2.0, we investigated the synt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2368ee153d82c1dff6025a0ec4baf399
Autor:
Violeta Dediu, Florina S. Iliescu, Florian Pistriţu, Ciprian Iliescu, Mihaela Carp, Alina-Cristina Bunea, Octavian Narcis Ionescu, Edwin Alexandru Laszlo
Publikováno v:
Micromachines, Vol 12, Iss 1091, p 1091 (2021)
Micromachines
Micromachines
Real-time “on-body” monitoring of human physiological signals through wearable systems developed on flexible substrates (e-skin) is the next target in human health control and prevention, while an alternative to bulky diagnostic devices routinely
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::89fad087ac7e529c7a5e5bf8e72a7146
https://www.mdpi.com/2072-666X/12/9/1091
https://www.mdpi.com/2072-666X/12/9/1091
Publikováno v:
2020 International Semiconductor Conference (CAS).
Deposition parameters of tetraethylorthosilicate (TEOS) layers on silicon substrate using Plasma Enhanced Chemical Vapor Deposition (PECVD) method were investigated We design the experiment taking into consideration chamber pressure, substrate temper
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::688b8c79ccbdf7aea629b153844bb6d4
https://doi.org/10.1109/cas50358.2020.9268003
https://doi.org/10.1109/cas50358.2020.9268003