Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Edward W. Rutter"'
Publikováno v:
Molecular Modeling and Multiscaling Issues for Electronic Material Applications ISBN: 9781461417279
Dielectric materials are universally used in the fabrication and packaging of microelectronic and display devices, as well as used in discrete devices such as sensors, switches and photovoltaics. However, as device and interconnect sizes become small
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e281850b285d6ab9c7f8ef26c0aa2619
https://doi.org/10.1007/978-1-4614-1728-6_2
https://doi.org/10.1007/978-1-4614-1728-6_2
Autor:
Ze-Yu Wu, Simi George, Song Yuan Xie, Thomas I. Wallow, Patrick P. Naulleau, Ahila Krishnamoorthy, Joseph Kennedy, Edward W. Rutter, Kyle Flanigan
Publikováno v:
SPIE Proceedings.
Line edge roughness evolutions in EUV resist patterns are investigated. Three dimensional scanning electron microscopy images show the pattern sidewall roughness to be highly anisotropic and the roughness to be propagating from the resistsubstrate in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e69af548bda9b56f3295b1f7127b9a5
https://doi.org/10.1117/12.848405
https://doi.org/10.1117/12.848405
Publikováno v:
Bioconjugate Chemistry. 2:180-186
The bifunctional chelating agents N,N,N',N'',N''-pentakis(carboxymethyl)-1- [(4-aminophenyl)methyl]-diethylenetriamine and N,N,N',N'',N''-pentakis(carboxymethyl)-1-[(4-aminophenyl)methyl]-4- methyldiethylenetriamine were prepared in six-step synthese
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::58f082523853eab93422280c8c5fea06
https://doi.org/10.1021/bc00009a007
https://doi.org/10.1021/bc00009a007
Autor:
Mehari Stifanos, Amanuel Gebrebrhan, Nancy Iwamoto, Ahila Krishnamoorthy, Deborah Yellowaga, Edward W. Rutter, Richard Spear, Emma Brouk
Publikováno v:
EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems.
Molecular modeling was employed to understand various properties found in thick film dielectric layers derived from solution-based sol-gel formulation in order to aid their development. For instance, for formulations used as planarizing layers, it wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::165a453c62879d4818def614b5949957
https://doi.org/10.1109/esime.2008.4525101
https://doi.org/10.1109/esime.2008.4525101
Autor:
Sudip Mukhopadhyay, Kyle Flanigan, Ronald R. Katsanes, Benjamin Wu, Songyuan Xie, Mark Slezak, Edward W. Rutter, Joseph Kennedy
Publikováno v:
Advances in Resist Materials and Processing Technology XXV.
This work discusses the development and characterization of Honeywell's middle layer material, UVAS, for trilayer patterning. The UVAS polymer contains high Si content constructed by polymerizing multiple monomers selected to produce a film that meet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c6fa4134e758e4f8804296adfc42b50
https://doi.org/10.1117/12.772854
https://doi.org/10.1117/12.772854
Publikováno v:
SPIE Proceedings.
Negative tone chemically amplified i-line resists possess several advantages compared to conventional DNQ-Novolak resist. These advantages include excellent lithographic performance at a fast, tunable photospeed, high transparency, high thermal flow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fdb9b3bb473d9415fadcab53002c020e
https://doi.org/10.1117/12.350264
https://doi.org/10.1117/12.350264
Autor:
Charles P. Casey, Edward W. Rutter
Publikováno v:
Inorganic Chemistry. 29:2333-2335
The reaction of CpRe(CO) 2 H 2 (3) with trans-Ir(CO)(Cl)(PPh 3 ) 2 (4) led to the formation of CpRe(CO) 3 (14) and of equimolar amounts of H 2 Ir(PPh 3 ) 2 (CO)(Cl) (15) and mer-H 2 Ir(PPh 3 ) 3 (Cl) (16). When the reaction was carried out in the pre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8df058eaa967dd53e8426384caec177e
https://doi.org/10.1021/ic00337a028
https://doi.org/10.1021/ic00337a028
Autor:
M. J. Radler, Pamela S. Foster, Robert F. Harris, Eric S. Moyer, J. N. Bremmer, Edward W. Rutter, M. T. Bernius, D. Castillo, A. J. G. Strandjord, R.H. Heistand, G. S. Becker
Publikováno v:
MRS Proceedings. 323
Negative working photodefinable benzocyclobutene formulations capable of obtaining patterned dielectric films from 1 to 20 microns thick are being developed using bisaryl azides as photocrosslinkers. Three different formulations are used to cover thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d133970cb84ed4065c3cabd7172aefe5
https://doi.org/10.1557/proc-323-267
https://doi.org/10.1557/proc-323-267
Autor:
Jonathan Halls, Joseph Kennedy, Jeremy Burroughes, Chris Newsome, Sharmil Ghouse, Ahila Krishnamoorthy, Edward W. Rutter
Publikováno v:
SID Symposium Digest of Technical Papers. 40:742
The development of organic planarizing films that can be cured at low temperature and demonstrate high optical transparency is reported. This material is targeted for low temperature (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6fe4ee786089077067664b234c7fac7a
https://doi.org/10.1889/1.3256894
https://doi.org/10.1889/1.3256894
Autor:
Edward W. Rutter, Charles P. Casey
Publikováno v:
Journal of the American Chemical Society. 111:8917-8919
Heterobimetallic compounds hold great promise as catalysts since the 2 different metals have the potential of acting cooperatively. The authors report that the new heterobimetallic dihydride C{sub 5}H{sub 5}(CO){sub 2}HRe-PtH(PPh{sub 3}){sub 2} (I){s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec9fde1680b3e0d9df05bd40ede3117e
https://doi.org/10.1021/ja00206a024
https://doi.org/10.1021/ja00206a024