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Publikováno v:
SPIE Proceedings.
A four phase transparent gate CCD has been fabricated using 1:1 projection printing on all photo-lithographic processes which required resist resolution in the 2-4 µm range on many of the masking levels. The photolithographic processes and technique
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c7d4788b024ba29703f4fbca35a84ea
https://doi.org/10.1117/12.956107
https://doi.org/10.1117/12.956107
