Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Edgar C. Buenconsejo"'
Publikováno v:
SPIE Proceedings.
The reticle manufacturing process induces various defects on the mask that need to be repaired. Missing absorber or clear defects are often repaired by depositing a carbon-based material (depo) using a Focused Ion Beam (FIB) tool. Few cases of such d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a038f4a6c9c23cf223eaea7436db4e7e
https://doi.org/10.1117/12.631637
https://doi.org/10.1117/12.631637
