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pro vyhledávání: '"Edavalath Hritwik N."'
Autor:
Ha Cheol Woo, Dupont Maxime, Kim Jongsu, Choi Jae Won, Lee Ji-Sun, Han Jisu, Yeon Si-Mo, Son Yong, Cheng Xiangming, Edavalath Hritwik N., Prabhakaran Prem
Publikováno v:
Materials & Design, Vol 212, Iss , Pp 110226- (2021)
Hydrogel precursor photoresists (HPR) are being studied widely due to the close similarities between HPR cured microstructures and biological materials. A vast majority of such resists are formulated in water and suffer from swelling-related inhomoge
Externí odkaz:
https://doaj.org/article/1d705b94633e4baf9fb8adbdd5949bcb
