Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Eckehard D. Onkels"'
Publikováno v:
SPIE Proceedings.
The advent of 157 nm F 2 lasers in lithographic application implied new challenges in spectral metrology. The approaches for the lithographic imaging system, that have been suggested so far, differ in the requirements of the spectral bandwidth of the
Autor:
Richard L. Sandstrom, Thomas P. Duffey, William N. Partlo, Eckehard D. Onkels, Alexander I. Ershov
Publikováno v:
SPIE Proceedings.
Highly line-narrowed F 2 laser operation in the VUV has been achieved for the first time by means of a master oscillator/power amplifier laser design. Different concepts have ben investigated experimentally for the master oscillator (MO) in order to
Publikováno v:
SPIE Proceedings.
A high average output power of a solid state laser is achieved by means of a temporal multiplexing method. It combines several laser beams and conserves the beam quality of each beam in the combined laser beam. The multiplexing method is demonstrated