Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Ebeling, R.P."'
Autor:
Bekman, H.H.P.T., Dekker, M.F., Ebeling, R.P., Janssen, J.P.B., Koster, N.B., Meijlink, J.R., Molkenboer, F.T., Nicolai, K., Putten, M. van, Rijnsent, C.G.J., Storm, A.J., Stortelder, J.K., Wu, C.C., Zanger, R.M.S. de
Publikováno v:
Proceedings International Conference on Extreme Ultraviolet Lithography 2019, SPIE Photomask Technology + EUV Lithography, 2019, Monterey, CA, USA, 11147
Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and install
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::e25c67dc58f9b58d613916dbdb080664
http://resolver.tudelft.nl/uuid:9473b2f5-ffd9-4a31-b37a-a472e816ec53
http://resolver.tudelft.nl/uuid:9473b2f5-ffd9-4a31-b37a-a472e816ec53
Autor:
Ushakov, A., Verlaan, A.L., Ebeling, R.P., Wu, C.C., O'Neill, R., Smith, M., Stratton, B., Koster, N.B., Gattuso, A., Lasnier, C.J., Feder, R., Maniscalco, M.P., Verhoeff, P.
Publikováno v:
Fusion Engineering and Design
One of the important aspects of the service life of the first and second optical mirrors (FM and SM) in ITER UWAVS diagnostics is to understand the influence of plasma cleaning on materials re-deposition and optical surface quality after multiple cle
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::e84ccf71ca39df4d3adda9090092a59c
http://resolver.tudelft.nl/uuid:a22800bb-fd70-40ad-a607-4a1296d6157b
http://resolver.tudelft.nl/uuid:a22800bb-fd70-40ad-a607-4a1296d6157b
Autor:
Zeijl, E. van, Schmits, R., Berg, J. H. van den, Harmsma, P.J., Westerveld, W.J., Lagioia, M., Bodis, P., Ebeling, R.P., Nieuwland, R.A., Yang. S., Lo Cascio, D.M.R., Agovic, K., Enderink, E.J., Vliet, R.E. van, Yousefi, M.
Publikováno v:
Proceedings Annual Symposium of the IEEE Photonics Society Benelux Chapter, Delft, The Netherlands, November 2010, p249–252
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::75c394031a5577832c85296974e3a153
http://resolver.tudelft.nl/uuid:6e64ff99-0333-47bb-83cc-4c5dd37c2e6b
http://resolver.tudelft.nl/uuid:6e64ff99-0333-47bb-83cc-4c5dd37c2e6b
Publikováno v:
IEEE International Radar Conference, May 10-14, 2010, Washington DC, USA, 981-986
High resolution radar imaging techniques can be used in ballistic missile defence systems to determine the type of ballistic missile during the boost phase (threat typing) and to discriminate different parts of a ballistic missile after the boost pha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::59ac2d0277eafd1643d1a796cf29255f
http://resolver.tudelft.nl/uuid:2a02e1b4-9b09-4179-a6d1-946c35dd4c3a
http://resolver.tudelft.nl/uuid:2a02e1b4-9b09-4179-a6d1-946c35dd4c3a