Zobrazeno 1 - 10
of 38
pro vyhledávání: '"E.H. te Kaat"'
Autor:
V.S. Varichenko, Lewis T. Chadderton, A. A. Melnikov, D. Fink, Wolfgang R. Fahrner, E.H. te Kaat, Salvador A. Cruz, Alexander M. Zaitsev, V. Hnatowicz
Publikováno v:
Radiation Effects and Defects in Solids. 132:81-90
Longitudinal dopant distribution along ion tracks in soft (polymers [1–5]) and hard (diamond [6,7]) condensed carbonaceous matter have been studied by neutron depth profiling and cathodoluminesence. Both in-diffusion from the aqueous phase and ener
Autor:
S. A. Fedotov, Wolfgang R. Fahrner, V.S. Varichenko, Alexander M. Zaitsev, E.H. te Kaat, A. A. Melnikov, F. F. Komarov
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 82:421-430
The effect of channeling of high energy ions through latent tracks in solids is described theoretically by means of transport equations. It is shown that deep tails in implanted impurity and radiation damage depth distributions by high energy ion imp
Autor:
V.S. Varichenko, E.H. te Kaat, W. R. Fahrner, Dietmar Fink, A. A. Melnikov, V. Hnatowicz, Salvador A. Cruz, Lewis T. Chadderton, Alexander M. Zaitsev
Publikováno v:
Radiation Effects and Defects in Solids. 126:247-250
(1993). Ion tracks in condensed carbonaceous matter. Radiation Effects and Defects in Solids: Vol. 126, No. 1-4, pp. 247-250.
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :807-812
Si/Si3N4/Si(100) silicon on insulator (SOI) structures formed by keV ion beam synthesis have been irradiated with 6 MeV Ni ions at doses of 1 to 13 × 1017 Ni/cm2. The microstructure as well as the composition of unirradiated, as-implanted and furnac
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :655-659
Type-A/A/A heteroepitaxial layer systems of Si/NiSi 2 /Si with thicknesses of 2.8 μm/0.5 μm/bulk have been formed by ion beam synthesis using 6 MeV 58 Ni high-dose implantation into (111)-silicon and furnace annealing. The layer systems are charact
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :726-730
Nitrogen ions with energies of 50 keV and 2 MeV were implanted into electrolytically polished samples of pure α-iron at room temperature (300 K). A method has been developed for preparing cross-sectional specimens which are suited for TEM investigat
Radiation damage and amorphization of (111) silicon after 2 MeV 14N ion implantation at temperatures from 125 to 450 K is studied in a dose range of 2 × 1013 to 5 × 1017 N cm−2 mainly by optical reflectivity depth profiling. Over a wide range of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::534a83184327f3fc9cac687e9013f5d3
https://opus.bibliothek.uni-augsburg.de/opus4/frontdoor/index/index/docId/17857
https://opus.bibliothek.uni-augsburg.de/opus4/frontdoor/index/index/docId/17857
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :279-284
High temperature (420-450 degrees C) N2+-implantations at 300 keV (150 keV per atom) into high resistivity p-type (001)-silicon substrates yield buried amorphous SiNx-layers for N-doses ranging from .1 to 1 x E18 cm-2. Thermal anneal at 1200 degrees
Publikováno v:
Radiation Effects. 45:33-43
Primary and secondary defect profiles in silicon crystals have been investigated after 2 MeV and 80 keV Si+ irradiation by electronmicroscopy and optical reflectivity measurements. The primary irradiation damage leads to a more or less amorphous laye
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 15:105-108
12 C and 14 N ions were implanted into silicon with intermediate energies between the validity regions of the LSS and Bethe-Bloch theories. Ranges were determined by optical reflectivity measurements at bevelled samples. A simple fitting formula for