Výsledky vyhledávání - "E. van Veldhoven"

A Design-of-Experiments Approach to Characterizing Beam-Induced Deposition in the Helium Ion Microscope

Autor: E. van Veldhoven, Larry Scipioni, Diederik Maas, Colin A. Sanford

Publikováno v: Microscopy Today, 3, 19, 22-26

Charged particle microscopes have been used extensively for the creation of nanostructures. As a subset of the techniques for this, the process of beam-induced chemistry offers almost endless flexibility for both additive (by beam-driven precursor de

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::09d5c60f6ad16d92d8c59476efc5c427
https://doi.org/10.1017/s1551929511000307

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Helium ion beam induced growth of hammerhead AFM probes

Autor: E. van Veldhoven, H. Sadeghian Marnani, Diederik Maas, Paul F. A. Alkemade, Gaurav Nanda

Publikováno v: Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, 33 (6), 2015
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 6, 33

The authors report the direct-write growth of hammerhead atomic force microscope (AFM) probes by He+ beam induced deposition of platinum-carbon. In order to grow a thin nanoneedle on top of a conventional AFM probe, the authors move a focused He+ bea

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a5131bf3b49b934981bcbaa6d3efd6bd
http://resolver.tudelft.nl/uuid:0239f9cc-0df8-44c7-981e-0403ae3189c3

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Sub-50 nm metrology on extreme ultra violet chemically amplified resist--A systematic assessment

Autor: Diederik Maas, Jeroen Meessen, R.W. Herfst, Hamed Sadeghian, Timon Fliervoet, E. van Veldhoven, V. Vaenkatesan

Publikováno v: The Review of scientific instruments. 86(10)

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0fc8a051e28edbea145408e77ed83b69
https://pubmed.ncbi.nlm.nih.gov/26520961

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[Untitled]

Autor: Max Glasbeek, Mauro Casalboni, Hong Zhang, F. De Matteis, Paolo Prosposito, Alessia Quatela, E. van Veldhoven

Publikováno v: Journal of Sol-Gel Science and Technology. 26:909-913

In the present work we report on steady-state and dynamical optical properties of four polymethine dye molecules absorbing in the near infrared (IR) region (0.8–1.1 μm) and emitting around 1.2 μm. The molecules are embedded in organically modifie

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https://doi.org/10.1023/a:1020732623656

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Femtosecond fluorescence studies of two-dimensional dynamics in photoexcited Michler's ketones

Autor: R.G Brown, Wolfgang Rettig, E. van Veldhoven, J.D Hepworth, Max Glasbeek, Hong Zhang

Publikováno v: Chemical Physics Letters, 363, 189-197. Elsevier

Femtosecond fluorescence upconversion experiments are reported for two diphenyl ketone dye molecules, the unbridged Michler's ketone [4,4′-bis(N,N-dimethylamino)-benzophenone] and its bridged derivative compound 3,6-bis(dimethylamino)-10,10-dimethy

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8e9789bf1f470148820245ec1dfdc3d4
https://doi.org/10.1016/s0009-2614(02)01176-4

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Evaluation of EUV resist performance below 20nm CD using helium ion lithography

Autor: Diederik Maas, A.K. van Langen-Suurling, Timon Fliervoet, Paul F. A. Alkemade, E. van Veldhoven, Sander Frederik Wuister, Rik Hoefnagels, Jeroen Meessen, Coen Verspaget

Publikováno v: Extreme Ultraviolet (EUV) Lithography V, 24-27 February 2014, San Jose, CA, USA, 9048

For the introduction of EUV lithography, development of high performance EUV resists is of key importance. This development involves studies into resist sensitivity, resolving power and pattern uniformity. We have used a sub-nanometer-sized 30 keV he

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::747e3cdd481437f9b6089cbf61903af3
https://doi.org/10.1117/12.2046917

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Femtosecond Fluorescence Anisotropy Studies of Solvation-Induced Intraligand Charge Transfer in Photoexcited Aluminum(III) Tris(8-hydroxyquinoline)

Autor: E. van Veldhoven, Hong Zhang, Max Glasbeek

Publikováno v: The Journal of Physical Chemistry. A, 105(A), 1687-1692. American Chemical Society
The Journal of Physical Chemistry. A. American Chemical Society

For the organic light emitting diode compound aluminum(III) tris(8-hydroxyquinoline) (Alq3), dissolved in dimethylformamide (DMF), the time dependence of the fluorescence anisotropy has been studied using the femtosecond fluorescence upconversion tec

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https://doi.org/10.1021/jp003540r

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Interaction of styrene with DODAB bilayer vesicles. influence on vesicle morphology and bilayer properties

Autor: A.M. van Herk, A.L. German, B. Briggs, M.J. Blandamer, Antonie J. W. G. Visser, P.M. Frederik, D.H.W. Hubert, E. van Veldhoven, M. Jung

Publikováno v: Langmuir 16 (2000)
Langmuir, 16, 968-979
Langmuir, 16(3), 968-979. American Chemical Society

The solubilization of styrene in large unilamellar DODAB vesicles is investigated at a styrene to DODAB molar ratio of 2:1. The combination of various vesicle characterization methods allows a simultaneous look at vesicle morphology (cryo-TEM, DLS) a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2880ac1f57814049b82e69d91a3d0798
https://doi.org/10.1021/la990698y

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Deposition, Milling, and Etching with a Focused Helium Ion Beam

Autor: E. van Veldhoven, Paul F. A. Alkemade

Publikováno v: Nanofabrication ISBN: 9783709104231

The recent successful development of the helium ion microscope has produced both a new type of microscopy and a new tool for nanoscale manufacturing. This chapter reviews the first explorations in this new field in nanofabrication. The studies that u

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::acb2074e7aaa86d4e20f33e15ae501c3
https://doi.org/10.1007/978-3-7091-0424-8_11

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Towards defect free EUVL reticles: carbon and particle removal by single dry cleaning proces and pattern repair by HIM

Autor: N.B. Koster, E. van Veldhoven, Sjoerd Oostrom, F.T. Molkenboer

Publikováno v: SPIE Proceedings.

We report on our findings on EUVL reticle contamination removal, inspection and repair. We show that carbon contamination can be removed without damage to the reticle by our plasma process. Also organic particles, simulated by PSL spheres, can be rem

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6de96713c83db2464d67d5a9794c11da
https://doi.org/10.1117/12.879216

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