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Publikováno v:
Applied Surface Science. :640-644
A new technique is proposed for the depth profiling of low energy As and P implants. We show that monitoring the monatomic negatively charged ions of As− and P−, using oxygen backfilling (flooding) in combination with low energy Cs+ sputtering, i
Publikováno v:
Applied Surface Science. :878-882
Multicollection system allows improvement of measurement reproducibility for isotope ratios on SIMS instruments provided that the other sources of measurement variability are well controlled. This paper presents analytical protocols developed to cont
Publikováno v:
Applied Surface Science. :954-958
The presence of shallow interfaces in the crater bottom surface can lead to the appearance of several reflected beams from different depths that can distort the calibration close to these interfaces. A multi-beam scattering model has been developed.
Publikováno v:
Applied Surface Science. :949-953
SIMS depth profiles for full wafer analyses were carried out on the CAMECA IMS Wf instrument. Experiments have been performed in order to investigate the analytical performance of this SIMS instrument for shallow, medium and deep profiles in terms of
Autor:
Chrystel Hombourger, Pierre-Francois Staub, E. de Chambost, M. Schuhmacher, C. Hitzman, F. Desse
Publikováno v:
Applied Surface Science. :383-386
A new technique, the Low energy Electron induced X-ray Emission Spectroscopy (LEXES) is used to determine dose of shallow dopants and film thicknesses; it is element selective and can resolve depth in the nanometer range. CAMECA has developed a speci
Publikováno v:
Applied Surface Science. :391-395
The depth scale calibration of a SIMS depth profile requires to determine the sputter rate used for the analysis from the crater depth measurement. An in situ crater depth measurement system based on the heterodyne laser interferometer has been devel
Publikováno v:
Fresenius' Journal of Analytical Chemistry. 365:12-18
The recent developments in magnetic sector SIMS are reviewed. It is not aimed at a detailed description of these instruments which, for several of them, can be found elsewhere [1–8] but reviews the driving forces making necessary the development of
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:341
The challenge for secondary ion mass spectroscopy is to accurately measure the profile shape for low-energy implants within the first few nanometers as well as to precisely determine the junction depth in the structure after any thermal treatment. Ev
Publikováno v:
Ferroelectrics. 93:5-11
This work reports preliminary results concerning the application of ferroelectric P(VDF-TrFE) 70/30 to a Programmable Neural Network System. It is focused on the programing of the memory, i.e. on the research of an addressing method inducing the lowe