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pro vyhledávání: '"E. Reznikova"'
Akademický článek
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Publikováno v:
Applied optics. 55(25)
Lenses with high numerical aperture are required for images with very high spatial resolution, which is difficult to realize in the x-ray range because of low-refraction-index decrement and relatively high absorption of x-rays in the material. Howeve
Autor:
Jürgen Mohr, G. T. Baumbach, E. Reznikova, Yu.L. Pivovarov, Venera Altapova, Alexey Ershov, Tomy dos Santos Rolo, Vladimir F. Pichugin
Publikováno v:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 6:394-397
The imaging methods used at the ANKA Synchrotron Light Source (Institute for Synchrotron Radiation, Karlsruhe Institute of Technology) are briefly reviewed. Examples of recent applications of the phase-contrast imaging method using a grating interfer
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 266:2165-2168
A set of compound refractive lenses (CRLs), mounted on a silicon wafer, was obtained from the Institut fur Mikrostrukturtechnik Karlsruhe. The CRLs were characterized at the BAMline at the synchrotron BESSYII in Berlin. It could be demonstrated that
Publikováno v:
Microsystem Technologies. 14:1299-1303
The reflectivity of grazing angle X-ray mirrors, used for X-ray deep lithography, is tested by means of a calorimetric method. A deviation in the reflectivity of a used mirror compared with the reflectivity of a clean surface is observed. This deviat
Publikováno v:
physica status solidi (a). 204:2811-2816
Planar X-ray refractive lenses with parabolic surface profile, and in crossed geometry to provide 2D focusing, are fabricated from SU-8 polymer using the LIGA process and deep X-ray lithography technology. A transmission X-ray microscope (TXM) using
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 603:150-152
LIGA including deep X-ray lithography has been used to form cross patterns in free-standing foils of different thickness between 20 and 2000 μm. The patterns show bandpass filter behaviors for wavelengths in the 300–800 μm region. Transmittances
Publikováno v:
Microsystem Technologies. 14:1727-1729
In this paper, the new method of measurements is presented for the technological control of the lithographic fabrication of high aspect ratio microstructures with complex side-wall profiles. The sampling procedure includes pouring polymer glue on a s
Akademický článek
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Autor:
T. Weitkamp, I. Zanette, G. Schulz, M. Bech, S. Rutishauser, S. Lang, T. Donath, A. Tapfer, H. Deyhle, P. Bernard, J.-P. Valade, E. Reznikova, J. Kenntner, J. Mohr, B. Müller, F. Pfeiffer, C. David, J. Baruchel, Ian McNulty, Catherine Eyberger, Barry Lai
Publikováno v:
AIP Conference Proceedings.
We report on the implementation of X‐ray grating interferometry at the imaging beamline ID19 of the European Synchrotron Radiation Facility (ESRF). We give a brief overview of the results obtained so far with this instrument and on ongoing developm