Zobrazeno 1 - 8
of 8
pro vyhledávání: '"E. P. Hollar"'
Publikováno v:
Philosophical Magazine. 83:2557-2571
Thermal annealing, irradiation with electrons (25-300 keV), and irradiation with photons (hν = 2.33-3.88 eV) have been used to stimulate the crystallization of isolated amorphous zones in Si, Ge, GaAs, GaP and InP. Transmission electron microscopy a
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 186:126-131
Isolated amorphous zones were created in Ge by implantation with 50 keV Xe ions. Recrystallization of these zones was stimulated by irradiation with electrons having energy from 25 to 300 keV. The process was studied by using transmission electron mi
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. :197-201
Electron transparent GaAs samples were implanted at 300 K and at 90 K with 50 keV Xe ions, which created small (∼8 nm in diameter) amorphous zones in the crystalline structure. These amorphous zones were observed using a transmission electron micro
Autor:
Hyun Chul Jin, Daewon Kwon, John R. Abelson, E. P. Hollar, Chih-Chiang Chen, J. David Cohen, Ian M. Robertson
Publikováno v:
Physical Review B. 60:4442-4445
Amorphous silicon films were prepared by dc reactive magnetron sputtering under a range of hydrogen or deuterium partial pressures approaching the phase transition to full microcrystallinity. Tunneling electron microscopy imaging indicated that these
Publikováno v:
AIP Conference Proceedings.
Spatially isolated amorphous zones in Si, Ge, GaAs, GaP and InP were created by low dose (≈ 1011 cm−2) 50 keV Xe ion implantations. The ion‐implanted samples were subsequently irradiated with electrons or photons which induced recrystallization
Publikováno v:
MRS Proceedings. 647
Crystallization of spatially isolated amorphous zones in Si, Ge, GaP, InP and GaAs was stimulated thermally and by irradiation with electrons and photons. The amorphous zones were created by a 50 keV Xe+ implantation. Significant thermal crystallizat
Autor:
E. P. Hollar, Daewon Kwon, John R. Abelson, Ian M. Robertson, J. David Cohen, Hyun-Chul Jin, Chih-Chiang Chen
Publikováno v:
MRS Proceedings. 557
Amorphous silicon films were prepared by dc reactive magnetron sputtering under conditions approaching the phase transition to microcrystallinity. Using TEM imaging these films were found to contain clusters of 5 to 50 nm sized Si crystallites embedd
Publikováno v:
MRS Proceedings. 540
Si and Ge samples of different substrate orientations were implanted with 50 keV Xe+ ions to a dose around 1011 ions/cm2 where the amorphous zones, created by individual ions, remained spatially isolated. The samples were subsequently irradiated at e