Zobrazeno 1 - 10
of 43
pro vyhledávání: '"E. M. Oks"'
Publikováno v:
Russian Physics Journal. 65:1613-1618
Publikováno v:
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes. 27:65-73
We have investigated the process of deposition of protective boron-based thin films by electron-beam evaporation of the solid boron target. The spatial distribution of vapor of the evaporated target, temperature during deposition, and the thickness o
Publikováno v:
Plasma Physics Reports. 48:1333-1338
Publikováno v:
Russian Physics Journal.
Autor:
A. V. Vizir, A. G. Nikolaev, E. M. Oks, V. P. Frolova, A. A. Cherkasov, M. V. Shandrikov, G. Yu. Yushkov
Publikováno v:
Russian Physics Journal. 64:2177-2184
Publikováno v:
Plasma Physics Reports. 48:178-182
Publikováno v:
Technical Physics Letters. 48:70-73
Autor:
A. V. Vizir, A. S. Bugaev, V. P. Frolova, V. I. Gushenets, A. G. Nikolaev, E. M. Oks, G. Yu. Yushkov
Publikováno v:
The Review of scientific instruments. 93(4)
In an ion source based on a pulsed planar magnetron sputtering discharge with gas (argon) feed, the fraction of metal ions in the ion beam decreases with decreasing gas pressure, down to the minimum possible working pressure of the magnetron sputteri
Publikováno v:
Physics of Plasmas. 29:093503
We describe our investigations of the current distribution in a non-self-sustained hollow-cathode glow discharge in a long metal tube. The discharge is initiated and sustained by injecting an electron beam generated by a forevacuum-pressure plasma–
Publikováno v:
Journal of Physics: Conference Series. 2291:012028
We have investigated generation of beam plasma near a dielectric (ceramic) target irradiated by a pulsed large-radius electron beam in the forevacuum pressure range 3–15 Pa. The electron beam was accelerated with voltage up to 8 kV. Under a certain