Zobrazeno 1 - 10
of 16
pro vyhledávání: '"E. Littau"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:1603-1610
We have developed and used an infrared diode laser absorption spectroscopy diagnostic to measure concentrations of fluorocarbon radicals, including CF, CF2, and CF3, during selective oxide etching with a low-pressure, high-density plasma reactor. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a60bcc9138397b0a6b566664e2758c6
https://doi.org/10.1116/1.1495510
https://doi.org/10.1116/1.1495510
Publikováno v:
Communications in Soil Science and Plant Analysis. 21:583-594
The goal was to develop an easy, fast, and economical procedure to produce plant digests that can be accurately analyzed by plasma emission spectrometry for foliar sulfur content. The closed vessel microwave procedure described requires less than 2 h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c536ba6e39275e52cfe6d52b4c45484d
https://doi.org/10.1080/00103629009368254
https://doi.org/10.1080/00103629009368254
Autor:
Han-Ku Cho, Christopher J. Raymond, Suk-Joo Lee, Joo-Tae Moon, Chang-Jin Sohn, Seong-Jin Kim, Michael E. Littau, Byungjoo James Youn, Sang-Gyun Woo, Jin Ah Kim, Seok-Hwan Oh, Soo-Bok Chin, Woo-Sung Han, Doo-Hoon Goo
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
As DRAM (Dynamic Random Access Memory) device continuously decreases in chip size, an increased speed and more accurate metrology technique is needed to measure CD (critical dimension), film thickness and vertical profile. Scatterometry is an optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac969a1a6aa0924619dada3584ca277b
https://doi.org/10.1117/12.536312
https://doi.org/10.1117/12.536312
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Scatterometry is a novel optical metrology that has received considerable attention in the silicon industry in the past few years. Based on the analysis of light scattered from a periodic sample, scatterometry technology can be thought of as consisti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f61526dd39c19f8f39afbf848fd2f02
https://doi.org/10.1117/12.538662
https://doi.org/10.1117/12.538662
Autor:
Jay M. Brown, David Godfrey, Chris Atkinson, Gary Zhang, Christopher J. Raymond, Colin L. Tan, Mark A. Boehm, Michael E. Littau, Changan Wang
Publikováno v:
SPIE Proceedings.
Lens spherical error is an important lens aberration used to characterize lens quality and also has a significant contribution to across chip line width variation (ACLV). It also impacts tool-to-tool matching efforts especially when the optical litho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0e646af4a31d5454c6912c9ad88716f
https://doi.org/10.1117/12.485437
https://doi.org/10.1117/12.485437
Autor:
Mark A. Boehm, Christopher J. Raymond, Gary Zhang, Stephen J. DeMoor, Michael E. Littau, Changan Wang
Publikováno v:
SPIE Proceedings.
The ability to accurately, quickly and automatically fingerprint the lenses of advanced lithography scanners has always been a dream for lithographers. This is truly necessary to understand error sources of ACLV, especially when the optical lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed8f98881c56388ded820cbf7bdf7a9e
https://doi.org/10.1117/12.485434
https://doi.org/10.1117/12.485434
Autor:
Byoungjoo James Youn, Young Seog Kang, Chang-Jin Sohn, Christopher J. Raymond, Michael E. Littau, Jin Ah Kim
Publikováno v:
SPIE Proceedings.
Scatterometry is a novel optical metrology based on the analysis of light diffracted from a periodic sample. In the past the technology has been applied successfully to a variety of different grating types found in the manufacture of microelectronic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83c33779f8278889d13e6c148579af24
https://doi.org/10.1117/12.488116
https://doi.org/10.1117/12.488116
Publikováno v:
SPIE Proceedings.
Scatterometry is a non-destructive optical metrology based on the analysis of light scattered form a periodic sample. In this research angular scatterometry measurements were performed on three wafers processed using shallow trench isolation (STI) te
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7dc47d541da9bc91c0e9e571f4244cba
https://doi.org/10.1117/12.436798
https://doi.org/10.1117/12.436798
Publikováno v:
SPIE Proceedings.
As modern circuit architecture features steadily decrease in size, more accurate tools are needed to meaningfully measure critical dimensions (CD). As a general rule, a metrology tool should be able to measure 1/10 of the product tolerance. As CD's c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1d937bc08a26c065d7d778a5453d34b
https://doi.org/10.1117/12.436754
https://doi.org/10.1117/12.436754
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:2122
Maintaining dimensional control and adequate throughput during the etching of submicron features requires plasma etch tools that operate at low pressures and high densities, such as inductively coupled plasmas (ICPs). Unfortunately, in this regime, i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c1423e03d15b6bd182b0db19126df10
https://doi.org/10.1116/1.1286396
https://doi.org/10.1116/1.1286396