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Publikováno v:
Journal of Physics: Conference Series. 2443:012014
In this paper the development of a software for electron beam melting and refining (EBMR) of different materials is presented. It has the following functional characteristics: simulation of the temperature distributions in the cast ingots, investigat
Publikováno v:
Journal of Physics: Conference Series. 2443:012007
Experimental investigation of negative electron resist AR-N 7520 profiles using an electron beam lithography system ZBA23 (Raith) is performed at variation of the exposure doses and the exposure patterns. The form of the obtained after the exposure r
Publikováno v:
Journal of Physics: Conference Series. 2443:012006
In this work, four types of negative electron beam resists are investigated. Electron beam lithography (EBL) experiments were conducted using EBL system ZBA23 (Raith) with the variable-shaped electron beam cross-section at 40 keV electron energy. Imp
Ag/ZnO nanostructures were synthesized using pulsed laser deposition (PLD) in open air (at atmospheric pressure). The deposition was carried out by a Nd:YAG laser, with the Ag layer composed of nanoparticles grown on SiO2 (001) substrates by the lase
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d001da859ddbbbbaad99824c0c16af6d
Publikováno v:
APPLIED PHYSICS OF CONDENSED MATTER (APCOM 2021).
The influence of electron beam lithography parameters (such as electron energy, resist thickness, the exposure dose) on the resist sidewall shape (profile) was studied for the PMMA (polymethyl-methacrylate) positive resist. The profile of the positiv
Publikováno v:
Journal of Physics: Conference Series. 2240:012037
Experimental results on the quality of electron beam melting and refining of copper samples by implementing the “method of washers” are analyzed by using an empirical model estimation approach. The influence is studied of the process parameters
Publikováno v:
Journal of Physics: Conference Series. 2240:012038
The electron beam welding process is analyzed of high-strength steel type 15Cr5Mo samples with deflection oscillations along the zone of interaction. The geometries of the molten and the heat affected zones are studied in order to investigate the inf
Publikováno v:
Journal of Physics: Conference Series. 2240:012050
This paper deals with the performance of the AR-N7520 (Allresist) negative electron beam resist (EB resist) which was selected as an etch mask for the fabrication of gratings on GaAs substrates. The developed resist sidewall shape is crucial for this
Autor:
L. Koleva, Tsvetomira Tsonevska, E Koleva, Monica R. Nemtanu, Mirela Brasoveanu, Volodia Dzharov
Publikováno v:
2020 International Conference Automatics and Informatics (ICAI).
The process of electron beam grafting is implemented for the production of highly efficient graft copolymers from natural polysaccharides and regulating their properties for application as flocculating agents during the treatment of different wastewa