Zobrazeno 1 - 5
of 5
pro vyhledávání: '"E. J. Hartford"'
Publikováno v:
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).
Developing doping technologies for the channel region of CMOS devices for 180 nm technology and beyond requires accurate profiles of electrically active dopants. We have recently improved the accuracy of spreading resistance profiles on sub-80 nm sou
Publikováno v:
Journal of Applied Physics. 67:4552-4554
A first‐principles tight‐binding formulation of the paramagnetic spin susceptibility is developed to study the temperature dependence of the magnetic properties of transition metals. The formulation, which includes many‐body enhancements, has b
Publikováno v:
The 1998 international conference on characterization and metrology for ULSI technology.
In the past, resistivity and carrier density profiles derived from spreading resistance measurements have been satisfactorily verified by comparing a doped layer’s measured sheet resistance, ρs, with a sheet resistance value calculated from the on
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:401
Over the years, several methods have emerged for determining the probe contact radius in spreading resistance measurements. The methods vary from attempting to determine the physical area of the probe contact to the use of the contact radius as a var
Publikováno v:
Journal of Applied Physics. 68:3799-3799