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Autor:
E. J. Devid, W. A. Bongers, P. W. C. Groen, M. van Ginkel, S. J. Doyle, F. M. A. Smits, C. F. A. M. van Deursen, K. Serras, S. Labeur, M. A. Gleeson, M. C. M. van de Sanden
Publikováno v:
Plasma, Vol 7, Iss 3, Pp 566-584 (2024)
Electrodeless Low-Frequency (LF)/Radio-Frequency (RF) plasma sources often suffer from low power coupling efficiencies due to the lack of overlapping field with the dynamic plasma load. However, the power supplies for these plasma sources typically h
Externí odkaz:
https://doaj.org/article/80c3a612d90547b392ad9bb77c676775
