Zobrazeno 1 - 2
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pro vyhledávání: '"E. I. Kantardjeva"'
Publikováno v:
Physica Status Solidi (a). 64:73-80
The oxidation kinetics of Si in oxygen rf plasma in a planar reactor is investigated. It is found that the dependence of the oxide layer thickness on oxidation time is characterized by a rapid initial region described by the Mott-Cabrera law, followe