Zobrazeno 1 - 10
of 281
pro vyhledávání: '"E. Gonsalves"'
Publikováno v:
Ingeniería Mecánica, Vol 4, Iss 3, Pp 7-10 (2001)
Se determina la capacidad de carga de las anclas de solicitación vertical, empleadas en la fijación de las plataformasperforadoras de petróleo de aguas profundas. Para ello, se desarrollan varios modelos del proceso de retención del ancla enel fa
Externí odkaz:
https://doaj.org/article/5e733ade77f54ecfaa3fa65a51a740b2
Autor:
Santu Nandi, Lalit Khillare, Sunil Kumar, Mohamad G. Moinuddin, Manvendra Chauhan, Sumit Choudhary, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Publikováno v:
ACS Applied Nano Materials. 6:4132-4140
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cde7967bd6bb7bd059dbed1ef772ba4d
https://doi.org/10.1021/acsanm.2c04831
https://doi.org/10.1021/acsanm.2c04831
Autor:
Santu Nandi, Lalit Khillare, Mohamad G. Moinuddin, Sunil Kumar, Manvendra Chauhan, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Publikováno v:
ACS Applied Nano Materials. 5:10268-10279
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4257a6f9e3071bba911accf1ee2dc13a
https://doi.org/10.1021/acsanm.2c01321
https://doi.org/10.1021/acsanm.2c01321
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8de001be456b3f5a8f4b2a9664df2e5c
https://doi.org/10.1117/1.jmm.21.4.044603
https://doi.org/10.1117/1.jmm.21.4.044603
Autor:
Mohamad G. Moinuddin, Manvendra Chauhan, Midathala Yogesh, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
Publikováno v:
ACS Applied Electronic Materials. 3:1996-2004
Given the current need for resist materials for patterning transistors with ultralow nodes, there has been a quest for developing resists with improved performance for nanoscale patterning with goo...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::588894457305d86846ecd66270e9faf6
https://doi.org/10.1021/acsaelm.0c01120
https://doi.org/10.1021/acsaelm.0c01120
Autor:
Kenneth E. Gonsalves, Subrata Ghosh, Manvendra Chauhan, Satinder K. Sharma, Nagarjuna Ravi Kiran
Publikováno v:
ACS Applied Electronic Materials. 2:3805-3817
Since the fabrication of micro-/nanoelectronic devices are marching toward ultralow node technology with dense patterns to meet the current industry demands, continuous advancement is needed in ter...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d39314b39b5dd67c7078bb2668122897
https://doi.org/10.1021/acsaelm.0c00627
https://doi.org/10.1021/acsaelm.0c00627
Autor:
Shivani Sharma, Manoj Sahani, Mohamad G. Moinuddin, Kenneth E. Gonsalves, Midathala Yogesh, Rudra Kumar, Satinder K. Sharma
Publikováno v:
ACS Applied Nano Materials. 3:8651-8661
Extending the resolution limit of next-generation lithography down to 15 nm or below requires the resist attaining small features, high irradiation sensitivity, and low line edge/width roughness. T...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db7294f3224c3d0b9737aa45a854f390
https://doi.org/10.1021/acsanm.0c01362
https://doi.org/10.1021/acsanm.0c01362
Autor:
Kenneth E. Gonsalves, Mohamad G. Moinuddin, Manvendra Chauhan, Satinder K. Sharma, Rudra Kumar
Publikováno v:
ACS Applied Materials & Interfaces. 12:19616-19624
Hybrid metal-organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to their ability for patterning down to ∼10 nm or below. High-resolution resist patterning is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e6e77844353212ac623e81c2356d638f
https://doi.org/10.1021/acsami.9b21414
https://doi.org/10.1021/acsami.9b21414
Publikováno v:
ACS Applied Polymer Materials. 2:1790-1799
Given the need for a next-generation technology node in the area of integrated circuits (ICs), improvement in the properties of resist materials, particularly sensitivity (ED), resolution, good etc...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd5020a41dd20264f36cd42843d7b017
https://doi.org/10.1021/acsapm.0c00005
https://doi.org/10.1021/acsapm.0c00005
Autor:
Juan E. Andrade, Hyeongyun Cha, Nenad Miljkovic, Jacob B. Hoffman, Julian H. Reed, Marianne Alleyne, Junho Oh, Sungmin Hong, Marco Toc, Kyoo D. Jo, Donald M. Cropek, Catherine E. Dana, Jessica K. Román, Andrew E. Gonsalves
Publikováno v:
ACS applied bio materials. 2(7)
Biofouling disrupts the surface functionality and integrity of engineered substrates. A variety of natural materials such as plant leaves and insect wings have evolved sophisticated physical mechanisms capable of preventing biofouling. Over the past
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::24af75022c8604bcfc7a126a3492e022
https://pubmed.ncbi.nlm.nih.gov/35030808
https://pubmed.ncbi.nlm.nih.gov/35030808