Zobrazeno 1 - 10
of 117
pro vyhledávání: '"E. G. Shustin"'
Autor:
E. G. Shustin, D. V. Kolodko, V. A. Luzanov, E. N. Mirgorodskaya, I. A. Sorokin, V. P. Tarakanov, M. P. Temiryazeva, E. S. Frolov
Publikováno v:
Plasma Physics Reports. 48:638-644
Autor:
E. G. Shustin
Publikováno v:
Plasma Physics Reports. 47:536-547
Abstract The process and applications of a specific type of gaseous discharge—beam–plasma discharge (BPD)—are reviewed. A brief survey of the BPD theory is presented. The basic features of BPD in active geophysical experiments with injection of
Publikováno v:
Plasma Physics Reports. 46:703-708
Results are presented of the particle-in-cell numerical simulations by the KARAT code of the formation of a plasma–beam discharge in the absence of both the longitudinal magnetic field and the initial plasma. Oscillations of the electric field gene
Publikováno v:
Technical Physics Letters. 46:497-500
A technique for growing thin graphite films on a dielectric substrate by annealing the Al2O3(0001)/Ni(111)/ta-C structure has been optimized. This technique is based on catalytic decomposition of hydrocarbons on the surface of a single-crystal cataly
Autor:
I. A. Sorokin, E. G. Shustin
Publikováno v:
Plasma Physics Reports. 44:1164-1168
Results of particle-in-cell simulation of the formation of a near-wall plasma layer produced by an ionization source remote from the chamber walls are verified experimentally. The measured profiles of the density and temperature of the plasma produce
Publikováno v:
Nonlinear World.
Problem statement. Development of methods for producing large-area isolated graphene under controlled conditions is an important task, which is primarily interested in the unique physical and chemical properties of graphene: high electrical and therm
Publikováno v:
Technical Physics. 62:1069-1072
Experimental results on the synthesis of thin graphite films with the aid of annealing of nickel films on carbon substrate are presented. Highly oriented pyrolitic graphite is used as the substrate to provide structural quality of the deposited nicke
Autor:
E. G. Shustin
Publikováno v:
Journal of Communications Technology and Electronics. 62:454-465
The review considers plasma-processing technologies used in solid-state electronics, both widely used and ones, which do not found yet industrial applications. Several from them are developed specifically for creating nanoelectronic devices. Tendenci
Publikováno v:
Technical Physics. 63:1157-1159
The results of experiments on the production of nano-crystalline graphite films in the hollow cathode discharge on Ni(111)/sapphire substrate are presented. The characteristics of the discharge for different gases and pressures are given. The emissio
Autor:
E. G. Shustin
Publikováno v:
Journal of Physics: Conference Series. 1393:012058
The technologies developed at V.A. Kotelnikov Institute of Radio Engineering and Electronics of RAS for specific application in nanoelectronics that are not used in industry are reviewed. Physical problems that were been solved at their development a