Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications

Autor: Fritz Phillipp, E. Dupois, A. Łaszcz, J. Katcki, P. A. van Aken, Nicolas Reckinger, J. Ratajczak, A. Czerwinski

Publikováno v: XIII International Conference on Electron Microscopy, EM'2008
XIII International Conference on Electron Microscopy, EM'2008, 2008, Cracow-Zakopane, Poland
Journal of Microscopy
Journal of Microscopy, Wiley, 2010, 237, pp.379-383. ⟨10.1111/j.1365-2818.2009.03264.x⟩
Journal of Microscopy, 2010, 237, pp.379-383. ⟨10.1111/j.1365-2818.2009.03264.x⟩

In this paper, we present results of transmission electron microscopy studies on erbium silicide structures fabricated under various thermal conditions. A titanium cap has been used as a protective layer against oxidation during rapid thermal anneali

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb316700dd1b9570dda140f834e88f92
https://doi.org/10.1111/j.1365-2818.2009.03264.x