Zobrazeno 1 - 10
of 22
pro vyhledávání: '"E. DiFabrizio"'
Autor:
Massimo Gentili, Ioannis Raptis, Zheng Cui, E. DiFabrizio, George P. Patsis, P. Prewett, G. Meneghini, Nikos Glezos, Anja Rosenbusch, B. Nowotny
Publikováno v:
Microelectronic Engineering. 46:379-382
A fast simulator for e-beam lithography called SELID, is presented. For the exposure part, an analytical solution based on the Boltzmann transport equation is used instead of Monte Carlo. All-important phenomena (backscattering, generation of seconda
Exposure latitude and CD control study for additively patterned X-ray mask with GBit DRAM complexity
Autor:
Hai Bin Chung, L. Grella, Hyung Joun Yoo, M. Baciocchi, Sang-Soo Choi, E. DiFabrizio, L. Mastrogiacomo, Massimo Gentili, Young Jin Jeon, L. Maggiora, D. Peschiaroli
Publikováno v:
Microelectronic Engineering. 30:195-198
40 kV electron beam lithography has been used to pattern gold plated x-ray masks containing GBit DRAM complexity layouts. The two commercial e-beam resists used, namely PMMA and SAL 601, both showed 0.12 μm resolution capability in dense and large l
Autor:
Barry P. Lai, L. Grella, E. DiFabrizio, V. White, S. Bajikar, M. Baciocchi, D. Denton, Wenbing Yun, Franco Cerrina, Y. H. Xiao, Dan G. Legnini, John J. Chrzas
Publikováno v:
Microelectronic Engineering. 21:99-102
Autor:
Azalia A. Krasnoperova, Daniel Legnini, Franco Cerrina, Zhonghou Cai, Massimo Gentili, Y. Xiao, Barry P. Lai, W. Yun, L. Yang, L. Grella, E. DiFabrizio
Publikováno v:
Review of Scientific Instruments. 66:2287-2289
A hard x‐ray imaging microscope based on a phase zone plate has been developed and tested. The zone plate, with a 5 cm focal length and a 0.2 μm smallest linewidth, was used to image 8 keV x rays from the samples. The imaging microscope can be use
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:1187
In this article a commercial e‐beam lithography machine (Leica Cambridge EBMF 10 cs/120) is used in metrological mode for critical dimension control of metal features with size down to 100 nm. The experimental backscattered electrons signal, collec
Autor:
Gerardo Perozziello, Carlo Liberale, Gheorghe Cojoc, P. Candeloro, Francesca Bragheri, Paolo Minzioni, Ilaria Cristiani, E. DiFabrizio
Publikováno v:
Scopus-Elsevier
We present novel miniaturized optical tweezers fabricated by two photon lithography on optical fibers. The integration of micro-tweezers in a microfluidic chip allows 3D trapping and spectroscopic analysis at a single cell level
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec53c51301e981ad6bb5e53a279233cd
http://www.scopus.com/inward/record.url?eid=2-s2.0-84893137121&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-84893137121&partnerID=MN8TOARS
Autor:
Lorenzo Vasanelli, R. Cingolani, Nico Lovergine, Ross Rinaldi, L. Grella, L. DeCaro, E. DiFabrizio, Massimo Gentili, C. Turco, Leander Tapfer
Publikováno v:
Scopus-Elsevier
We have fabricated ZnSe/ZnS quantum wires emitting at the shortest wavelength ever reported for a one-dimensional system. We show that inhomogeneous strain relaxation and Stark effect due to the internal piezoelectric field influence the ground level
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3c686a2ad9dd636305ee21d636f5a3a9
http://www.scopus.com/inward/record.url?eid=2-s2.0-0031342759&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0031342759&partnerID=MN8TOARS
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