Zobrazeno 1 - 10
of 53
pro vyhledávání: '"E. Cekan"'
Autor:
T. Enzenhofer, M. Dineva, M. Marksteiner, M. Peruzzi, R. Korntner, E. Cekan, Khurram Siraj, Wolfgang Lang, Dieter Bäuerle, Johannes D. Pedarnig, Elmar Platzgummer, Hans Loeschner
Publikováno v:
Microelectronic Engineering. 83:1495-1498
A novel method allows for a direct modification of the electric properties of high-temperature superconductors (HTS) and for patterning of devices into thin films of HTS. A low-divergence beam of light ions is directed at a thin film of HTS through a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::73c749fc9bbbddbf16708320de37bc01
https://doi.org/10.1016/j.mee.2006.01.091
https://doi.org/10.1016/j.mee.2006.01.091
Autor:
Stefan Hirscher, M. Zeininger, A. Chylik, H. Buschbeck, R. Käsmaier, S. Eder, Gerhard Stengl, M. Kümmel, A. Chalupka, Hans Loschner, Oliver Kirch, Andreas Wolter, T. Windischbauer, E. Cekan, R. Nowak, C. Horner, Wolf-Dieter Domke
Publikováno v:
Microelectronic Engineering. :301-307
Ion projection lithography (IPL) uses electrostatic ion-optics for reduction printing of stencil mask patterns to wafer substrates. The IPL process development tool (PDT) prints field sizes of 12.5 mm×12.5 mm (wafer) at a demagnification factor of 4
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::389a87fab0fd1661ea1acfc80d97550b
https://doi.org/10.1016/s0167-9317(02)00529-4
https://doi.org/10.1016/s0167-9317(02)00529-4
Autor:
C. Horner, Stefan Hirscher, E. Cekan, Andreas Wolter, Rainer Kaesmaier, Hans Loschner, M. Zeininger, J Ochsenhirt, Wolf-Dieter Domke
Publikováno v:
Microelectronic Engineering. :517-524
Ion projection lithography (IPL) is designed to realize resist structures on the wafer plane well below 100 nm. Patterns from a stencilmask are printed with 4× reduction using an electrostatic lens system. First exposures with the IPL Process Develo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::456b8fd651180ca56a377a271c77f33a
https://doi.org/10.1016/s0167-9317(01)00543-3
https://doi.org/10.1016/s0167-9317(01)00543-3
Publikováno v:
Cell Proliferation. 34:85-98
From clinical studies in cancer patients and experimental in vitro studies, there is evidence of an increased cytotoxic effect, and even synergy, when irradiation is combined with 5-fluorouracil (5-FU). The mechanism for this is unclear. Materials an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b2daf89be625165ddf8dc2a90d87f71
https://doi.org/10.1046/j.1365-2184.2001.00200.x
https://doi.org/10.1046/j.1365-2184.2001.00200.x
Autor:
Gertraud Lammer, Herbert Buschbeck, B. Mertens, Gerhard Stengl, Arno Jan Bleeker, M. Zeininger, C. Horner, P. W. H. de Jager, E. Cekan, Herbert Vonach, Hans Loschner, E. Munro
Publikováno v:
Microelectronic Engineering. 53:617-620
Coulomb interaction limits the beam current for a required resolution but it can be influenced by the layout of the optical system. Therefore it is necessary to obtain design information for future charged particle lithography tools. Monte Carlo simu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2c128046f84b7a53b98adf91832760c
https://doi.org/10.1016/s0167-9317(00)00390-7
https://doi.org/10.1016/s0167-9317(00)00390-7
Autor:
W. Fallmann, A. Chalupka, F. Paschke, E. Cekan, H. Buschbeck, E. Hammel, G. Stangl, H. Vonach, Gerhard Stengl, Hans Loschner
Publikováno v:
Microelectronic Engineering. 30:241-244
Optical and X-Ray proximity printing systems are resolution limited by diffraction and beam dispersion. Parallel dispersion free ion beam systems are therefore ideal to transfer stencil mask patterns onto all sorts of nonideal substrates. A feasibili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f55516fa4577d66f81ba907f56ca6640
https://doi.org/10.1016/0167-9317(95)00236-7
https://doi.org/10.1016/0167-9317(95)00236-7
Publikováno v:
Microelectronic Engineering. 17:241-244
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba64a843284eba6e066f251127b8316d
https://doi.org/10.1016/0167-9317(92)90048-v
https://doi.org/10.1016/0167-9317(92)90048-v
Publikováno v:
Toxicology. 61:135-146
The effects of dietary supplementation with sodium selenite (3.0 or 4.5 ppm Se) for 8 weeks prior to and throughout gestation on sodium salicylate induced embryo- and fetotoxicity (resorptions, fetal deaths, malformations, fetal weight reduction) hav
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::592e16e93968c229d0824f2b971a2b48
https://doi.org/10.1016/0300-483x(90)90015-9
https://doi.org/10.1016/0300-483x(90)90015-9
Autor:
Elmar Platzgummer, Wolfgang Lang, Dieter Bäuerle, E. Cekan, R. Korntner, Johannes D. Pedarnig, Khurram Siraj, T. Enzenhofer, M. Peruzzi, Hans Loeschner, M. Dineva, M. Marksteiner
Publikováno v:
2006 IEEE Conference on Emerging Technologies - Nanoelectronics.
Ion-beam irradiation allows for a direct modification of the electric properties of high-temperature superconductors (HTS). Computer simulations of the ion-target interactions reveal that He+ions at energies above 60 keV do not implant into 100-nm th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30aef8d5006fa9ac8b7661eac4cee92c
https://doi.org/10.1109/nanoel.2006.1609693
https://doi.org/10.1109/nanoel.2006.1609693
Publikováno v:
Cell proliferation. 34(2)
From clinical studies in cancer patients and experimental in vitro studies, there is evidence of an increased cytotoxic effect, and even synergy, when irradiation is combined with 5‐fluorouracil (5‐FU). The mechanism for this is unclear. MATERIAL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::8e9d0349b83511bf396b5caf36ebbb3f
https://pubmed.ncbi.nlm.nih.gov/11348424
https://pubmed.ncbi.nlm.nih.gov/11348424