Zobrazeno 1 - 10
of 26
pro vyhledávání: '"E V Barnat"'
Publikováno v:
Plasma Sources Science and Technology. 27:055020
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8d8b8568551c8d6895bec94e9cd9ca5
https://doi.org/10.1088/1361-6595/aac309
https://doi.org/10.1088/1361-6595/aac309
Publikováno v:
Review of Scientific Instruments. 74:3385-3389
A technique used to obtain the evolution of the electrical resistivity of ultrathin films during growth in a plasma environment is described. Details are given on the physical construction of the substrate assembly that house specially prepared subst
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::565f936d1a58c70e2ceb1f11a2ad53fd
https://doi.org/10.1063/1.1556947
https://doi.org/10.1063/1.1556947
Autor:
G. A. Hebner, E. V. Barnat
Publikováno v:
Applied Physics Letters. 85:3393-3395
Spatially resolved electric fields in the sheath region near a metal–dielectric junction were measured in a radio-frequency-driven argon plasma. The fields were determined by observing the Stark shifted transitions to the 13d[3∕2]1 Rydberg state
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e29e45fd59cb28be54d662f21c2876cd
https://doi.org/10.1063/1.1766075
https://doi.org/10.1063/1.1766075
Autor:
E. V. Barnat, Toh-Ming Lu
Publikováno v:
Physical Review E. 66
A one-dimensional model is used to describe the evolution of charged particles in a plasma sheath driven by an asymmetrically pulsed dc bias in the frequency range of 100 kHz to 10 MHz. The temporal-spatial evolution of the sheath is obtained through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e03b1f3613d35f5cfe76b0b490a7da64
https://doi.org/10.1103/physreve.66.056401
https://doi.org/10.1103/physreve.66.056401
Publikováno v:
MRS Proceedings. 721
The electrical resistivities of copper films sputtered in either argon or an argon-hydrogen atmosphere are measured in real time, during growth. The electrical resistivities for both cases are observed to be functions of the film's thickness, with th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::67c8344db77f248c03a744add85b268f
https://doi.org/10.1557/proc-721-j3.6
https://doi.org/10.1557/proc-721-j3.6
Autor:
Pei-I Wang, Krishna Rajan, G.-R. Yang, Toh-Ming Lu, Shyam P. Murarka, Y.-C. Chen, Xiang Li, E. V. Barnat
Publikováno v:
MRS Proceedings. 615
Cu-Al alloys have been recommended for application as the diffusion barriers/adhesion promoters for advanced copper based metallization schemes. This approach to barrier formation is to generate an ultra-thin interfacial layer through Cu alloying wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a468b71d1c98282f5a1980ac5234af8
https://doi.org/10.1557/proc-615-g7.5.1
https://doi.org/10.1557/proc-615-g7.5.1
Autor:
E. V. Barnat, G. A. Hebner
Publikováno v:
Journal of Applied Physics. 98:013305
Nonuniformities in both sheath electric field and plasma excitation were observed around dissimilar metals placed on a rf electrode. Spatial maps of the rf sheath electric field obtained by laser-induced fluorescence-dip (LIF-dip) spectroscopy show t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a4faad4c57903f332ac5bd8527348779
https://doi.org/10.1063/1.1941481
https://doi.org/10.1063/1.1941481
Autor:
G. A. Hebner, E. V. Barnat
Publikováno v:
Journal of Applied Physics. 97:063301
Plasma and sheath structure around a rf excited stepped electrode is investigated. Laser-induced fluorescence dip spectroscopy is used to spatially resolve sheath fields in an argon discharge while optical emission and laser-induced fluorescence are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::343855c66ee38e95bb66ae6f70fd94e3
https://doi.org/10.1063/1.1846939
https://doi.org/10.1063/1.1846939
Publikováno v:
Plasma Sources Science & Technology; May2018, Vol. 27 Issue 5, p1-1, 1p
Autor:
E V Barnat, A Fierro
Publikováno v:
Journal of Physics D: Applied Physics; 4/12/2017, Vol. 50 Issue 14, p1-1, 1p