Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Dwayne L. LaBrake"'
Autor:
Philip D. Schumaker, Mario J. Meissl, Babak Mokaberi, Sidlgata V. Sreenivasan, Niyaz Khusnatdinov, Anshuman Cherala, Kosta Selinidis, Dwayne L. LaBrake, Byung Jin Choi
Publikováno v:
IEEE/ASME Transactions on Mechatronics. 20:122-132
Jet and flash imprint lithography steppers have demonstrated unprecedented capability for patterning of sub-25-nm features for semiconductor manufacturing. A critical requirement for such patterning is the ability to overlay one layer of a device to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9e138f3669dd0cc4207f43c1ecd281a
https://doi.org/10.1109/tmech.2013.2297679
https://doi.org/10.1109/tmech.2013.2297679
Autor:
Jerry Chen, Zhengmao Ye, Fred Alokozai, Brennan Milligan, Gary Doyle, Dwayne L. LaBrake, Douglas J. Resnick, Niyaz Khusnatdinov
Publikováno v:
SPIE Proceedings.
Pattern transfer is critical to any lithographic technology, and plays a significant role in defining the critical features in a device layer. As both the memory and logic roadmaps continue to advance, greater importance is placed on the scheme used
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b7eddd2bc2c8e389c654ec3c42e7342
https://doi.org/10.1117/12.2260455
https://doi.org/10.1117/12.2260455
Autor:
Brian Fletcher, Van N. Truskett, Niyaz Khusnatdinov, Whitney Longsine, Wei Zhang, Tim Stachowiak, Dwayne L. LaBrake, Ecron Thompson, Zhengmao Ye, J. W. Irving, Weijun Liu, Matthew C. Traub
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5712d3283ebb51563e1bc1bb2f09484c
https://doi.org/10.1117/12.2219161
https://doi.org/10.1117/12.2219161
Autor:
Niyaz Khusnatdinov, Dwayne L. LaBrake, E. Sikorski, R. S. Shenoy, Cynthia B. Brooks, Ying Zhang, Kailash Gopalakrishnan, Arnie Ford, Gerard M. Schmid, Douglas J. Resnick, Ron Jih, Jordan Owens, Mary Beth Rothwell, Mark W. Hart
Publikováno v:
Microelectronic Engineering. 85:856-860
Optical lithography has been successful in achieving deep sub-wavelength images by the continuous improvement of lens systems, resists and the introduction of phase shift masks. One of the key challenges in attempting to pattern feature sizes less th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd3736a9fbfaa9ad14e0c6c08fe8ad32
https://doi.org/10.1016/j.mee.2008.01.041
https://doi.org/10.1016/j.mee.2008.01.041
Autor:
Whitney Longsine, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Luo Kang, Niyaz Khusnatdinov, Weijun Liu, Brian Fletcher, J. W. Irving, Van N. Truskett, Frank Y. Xu, Matthew S. Shafran, Tim Stachowiak, Zhengmao Ye, Matthew C. Traub, Xiaoming Lu
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4140a301356c6b1f46c4b10a865bdba
https://doi.org/10.1117/12.2048189
https://doi.org/10.1117/12.2048189
Autor:
Paul Hofemann, Vik Singh, Mahadevan GanapathiSubramanian, Fen Wan, Douglas J. Resnick, Se Hyun Ahn, Frank Y. Xu, Marlon Menezes, Jin Choi, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Shuqiang Yang, Michael I. Miller
Publikováno v:
SPIE Proceedings.
Extremely large-area roll-to-roll (R2R) manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::088d79e228163b634a523d55dfd82275
https://doi.org/10.1117/12.2048172
https://doi.org/10.1117/12.2048172
Autor:
Paul Hellebrekers, Paul Hofemann, Ecron Thompson, Sidlgata V. Sreenivasan, Douglas J. Resnick, Dwayne L. LaBrake
Publikováno v:
SPIE Proceedings.
The next step in the evolution of wafer size is 450mm. Any transition in sizing is an enormous task that must account for fabrication space, environmental health and safety concerns, wafer standards, metrology capability, individual process module de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a1a10095f9e80eecbd297ea0b740d25
https://doi.org/10.1117/12.2029275
https://doi.org/10.1117/12.2029275
Autor:
Matthew S. Shafran, Whitney Longsine, Wei Zhang, J. W. Irving, Saul Lee, Weijun Liu, Brian Fletcher, Van N. Truskett, Luo Kang, Douglas J. Resnick, Xiaoming Lu, Sidlgata V. Sreenivasan, Zhengmao Ye, Frank Y. Xu, Dwayne L. LaBrake
Publikováno v:
Alternative Lithographic Technologies V.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography (J-FIL) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e750e50fd1ef6de9e605c2c80bdda2ae
https://doi.org/10.1117/12.2013694
https://doi.org/10.1117/12.2013694
Autor:
Paul Hellebrekers, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Zhengmao Ye, M. Melliar-Smith, Scott Carden, Douglas J. Resnick
Publikováno v:
Alternative Lithographic Technologies IV.
The use of bit pattern media beyond densities of 1Tb/in2 requires the ability to pattern dimensions to sub 10nm. This paper describes the techniques used to reach these dimensions with imprint lithography and avoid such challenges as pattern collapse
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5db277b09b4945937f8572e9026ebbd8
https://doi.org/10.1117/12.918042
https://doi.org/10.1117/12.918042
Autor:
Joseph Michael Imhof, Laura Brown, Douglas J. Resnick, Kosta Selinidis, Dwayne L. LaBrake, Sidlgata V. Sreenivasan, Gary Doyle, Christopher Michael Jones
Publikováno v:
SPIE Proceedings.
The Jet and Flash Imprint Lithography (J-FILTM) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for memory ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d11285df2a7d94b94ceb2d3276bdc56
https://doi.org/10.1117/12.898865
https://doi.org/10.1117/12.898865