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pro vyhledávání: '"Duohui Bei"'
Publikováno v:
2018 China Semiconductor Technology International Conference (CSTIC).
As CMOS is being scaled down to 28nm node and beyond, it is necessary to reduce k value in order to improve RC delay. ULK (ultra-low k) (k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::589a5a82d0a1c112ac1070f222417870
https://doi.org/10.1109/cstic.2018.8369280
https://doi.org/10.1109/cstic.2018.8369280
