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pro vyhledávání: '"Duencheng Fang"'
Autor:
Duencheng Fang, R. Kenneth Marcus
Publikováno v:
Spectrochimica Acta Part B: Atomic Spectroscopy. 46:983-1000
Plasma properties of electron temperature, average electron energy, electron energy distribution function, and electron and positive ion number densities in the negative glow region are determined for a range of discharge conditions for various catho
Autor:
Duencheng Fang, R. Kenneth Marcus
Publikováno v:
Spectrochimica Acta Part B: Atomic Spectroscopy. 45:1053-1074
The application of the single Langmuir probe techniques to the measurement of electron temperature, electron number density, positive ion number density, average electron energy and electron energy distribution functions in the negative glow region o
Autor:
Duencheng Fang, R. Kenneth Marcus
Publikováno v:
Glow Discharge Spectroscopies ISBN: 9781489923967
When a sufficiently high voltage is applied across two electrodes immersed in a gaseous medium, atoms and molecules of that medium will break down electrically, forming electron-ion pairs and permitting current to flow. The phenomenon of current flow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edcf4f64d53f9a0fa451a9eb418a9826
https://doi.org/10.1007/978-1-4899-2394-3_2
https://doi.org/10.1007/978-1-4899-2394-3_2
Publikováno v:
Journal of Analytical Atomic Spectrometry. 7:1303
Autor:
Duencheng Fang, Purnesh Seegopaul
Publikováno v:
Journal of Analytical Atomic Spectrometry. 7:959
A new sample preparation protocol for high-purity titanium material has been developed for analysis by glow discharge mass spectrometry. The titanium material is machined using an aluminium oxide cut-off wheel followed by a double etching process wit
Publikováno v:
Journal of Analytical Atomic Spectrometry. 5:569
An automated Langmuir probe system employing a microcontroller as the interface between the experiment and host computer is presented. The effects of the scanning rate of applied voltage and those of sputtered atom deposition on the measured plasma p
Autor:
R. Kenneth Marcus, Duencheng Fang
Publikováno v:
Spectrochimica Acta Part B: Atomic Spectroscopy. 43:1451-1460
A parametric evaluation of the principal factors which affect cathodic sputtering rates in glow discharge sources is performed. Employing a planar, disk cathode in the simple diode geometry, the roles of discharge voltage, current, and pressure are e
Publikováno v:
Journal of the Chemical Society, Dalton Transactions. :1397
[M(SnPh3)(MeCN)2(CO)2(NO)][(1) M = Cr; (2) M = W] react with P(OMe)3, PEt3, and [N(PPh3)2][S2CNEt2] to form the complexes [Cr(SnPh3)(MeCN){P(OMe)3}(CO)2(NO)](3), [M(SnPh3){P(OMe)3}2(CO)2(NO)][(4) M = Cr; (5) M = W], [M(SnPh3)(PEt3)2(CO)2(NO)][(6) M =
Autor:
R. Kenneth Marcus, Duencheng Fang
Publikováno v:
Journal of Analytical Atomic Spectrometry. 3:873
Studies were carried out in an attempt to elucidate the role that alloy (sample) components have on the atomisation and excitation characteristics of glow discharge devices. A series of α-phase brass alloys were sputtered to determine net sputter ra
Publikováno v:
In Inorganica Chimica Acta 1989 161(2):239-245