Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Duck-Hyung Hur"'
Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::816f50517c704e74f2e311471ba93ba3
https://doi.org/10.1117/12.918057
https://doi.org/10.1117/12.918057
Publikováno v:
SPIE Proceedings.
Fabricating defect-free mask blanks remains a major "show-stopper" for adoption of EUV lithography. One promising approach to alleviate this problem is reticle floorplanning with the goal of minimizing the design impact of buried defects. In this wor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7898d984315b8463bcaa748ef44a2220
https://doi.org/10.1117/12.881667
https://doi.org/10.1117/12.881667
Autor:
Duck-Hyung Hur, Jeong-Taek Kong, Yong-Hee Park, Dong-Hyun Kim, Yongchan Ban, Moon-Hyun Yoo, Ji-Suk Hong
Publikováno v:
SPIE Proceedings.
As the k1 factor of lithography process goes lower, model-based optical proximity correction (OPC) has become the most important step of post-tape-out data preparation for critical mask levels. To apply model-based OPC, a lithographic model with opti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f11899a4c2d2ddab7cf6c2ef3e12036e
https://doi.org/10.1117/12.656762
https://doi.org/10.1117/12.656762
Publikováno v:
Japanese Journal of Applied Physics. 50:06GB11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6175762c66c2eab14b3c5a38888f5581
https://doi.org/10.7567/jjap.50.06gb11
https://doi.org/10.7567/jjap.50.06gb11
Publikováno v:
Japanese Journal of Applied Physics. 50:06GB11
In this paper, we proposed a new design based metrology system to save runtime for the detection of crucial lithographic defects. To the best of our knowledge, we developed for the first time the weak point management system that is a database contro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a974667f47ece98077589da4d42a4c76
https://doi.org/10.1143/jjap.50.06gb11
https://doi.org/10.1143/jjap.50.06gb11