Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions

Autor: Du Vo-Thanh, Catherine Chaton, Névine Rochat, Geneviève Duchamp, G. Imbert, Vivien Cartailler, Hélène Fremont, Daniel Benoit

Publikováno v: Thin Solid Films
Thin Solid Films, Elsevier, 2020, 698, pp.137874-. ⟨10.1016/j.tsf.2020.137874⟩
Thin Solid Films, 2020, 698, pp.137874-. ⟨10.1016/j.tsf.2020.137874⟩
Thin Solid Films, 2020, ⟨10.1016/j.tsf.2020.137874⟩

Absorption of moisture by thin dielectric materials alters their properties and can cause several reliability issues. Even at standard room temperature and low humidity level, some dielectric materials are sensitive to moisture. In this study, moistu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::942bb62d4d82ad1d6f978f756e37f5f3
https://hal.archives-ouvertes.fr/hal-03489597