Zobrazeno 1 - 10
of 129
pro vyhledávání: '"Dry film photoresist"'
Autor:
Yurim Han, Cristiano D’Andrea, Mirine Leem, Ji-Won Jung, Sooman Lim, Paolo Matteini, Byungil Hwang
Publikováno v:
Engineering Science and Technology, an International Journal, Vol 60, Iss , Pp 101892- (2024)
Surface-enhanced Raman spectroscopy (SERS) has garnered increasing attention for its ability to detect molecules even at low concentrations; however, the fabrication methods for SERS sensors require further study aimed at simple and rapid on-body and
Externí odkaz:
https://doaj.org/article/fd4231ccfd094f29aa871433fd937b17
Autor:
Sadia Farjana, Esperanza Alfonso, Per Lundgren, Vessen Vassilev, Peter Enoksson, Ashraf Uz Zaman
Publikováno v:
IEEE Access, Vol 11, Pp 43630-43638 (2023)
This article presents the first use of a multilayer dry film photoresist to fabricate a slot array antenna by micromachining. The proposed fabrication process demonstrates a straightforward and fast method of realizing antenna structures and delicate
Externí odkaz:
https://doaj.org/article/0d2188d518cc4301b0490895d7136f9a
Akademický článek
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Autor:
Byungil Hwang, Paolo Matteini
Publikováno v:
Fashion and Textiles, Vol 9, Iss 1, Pp 1-12 (2022)
Abstract Silver (Ag) nanowires have attracted significant attention as flexible electrodes for various wearable electronic devices owing to their excellent optical and electrical properties. Patterning is an important step in the fabrication of Ag na
Externí odkaz:
https://doaj.org/article/96dce7e91db448ff8727d0c071d3e5ca
Publikováno v:
Fashion and Textiles, Vol 9, Iss 1, Pp 1-8 (2022)
Abstract With technological advances in wearable health care monitoring system, there increasing demands for the patterning technology for reliable sensors. Dry-film photoresists (DFRs) have several advantages for the patterning of silver nanowires (
Externí odkaz:
https://doaj.org/article/4cfe134a9e80434a817bc2fc8771c0f0
Publikováno v:
IEEE Access, Vol 10, Pp 27432-27439 (2022)
A micromachined ridge gap waveguide power divider operating at 220–325 GHz is presented. The device is fabricated by SUEX dry film photoresist. Dry film photoresist can be used to obtain geometrical features with high accuracy using a robust fabric
Externí odkaz:
https://doaj.org/article/de8c7a19f1ce47dd936f51a48e48d25a
Publikováno v:
Materials & Design, Vol 213, Iss , Pp 110370- (2022)
Photoresists play an important role in the electronic information industry; however, traditional photoresists have disadvantages including severe volume shrinkage, low precision, and poor adhesion. Here, a combined free radical / cationic dual-curing
Externí odkaz:
https://doaj.org/article/bc0d2d5f7b1143edad79d929c2b8f467
Publikováno v:
International Journal of Technology, Vol 10, Iss 5, Pp 1033-1041 (2019)
This paper offers an alternative method of making PCB routing using a negative dry film photoresist and a maskless photolithography method. The objective of this research is determining the correct parameters for the process of making PCB design e
Externí odkaz:
https://doaj.org/article/96642ad021084a2398d721b556ff0e84
Autor:
Nikita Sitkov, Tatiana Zimina, Alexey Kolobov, Evgeny Sevostyanov, Valentina Trushlyakova, Viktor Luchinin, Alexander Krasichkov, Oleg Markelov, Michael Galagudza, Dmitry Kaplun
Publikováno v:
Micromachines, Vol 13, Iss 1, p 20 (2021)
A study of the peculiarities and a comparative analysis of the technologies used for the fabrication of elements of novel hybrid microfluidic biochips for express biomedical analysis have been carried out. The biochips were designed with an incorpora
Externí odkaz:
https://doaj.org/article/693f35be37874829a1b73daa02afc794
Publikováno v:
Micromachines, Vol 12, Iss 3, p 260 (2021)
This paper presents a novel fabrication method based on dry film photoresists to realize waveguides and waveguide-based passive components operating at the millimeter-wave frequency (30–300 GHz). We demonstrate that the proposed fabrication method
Externí odkaz:
https://doaj.org/article/a626e79159574d34adacb463d0ec528b