Fast deposition of amorphous hydrogenated silicon layers

Autor: Meeusen, G.J., Driessens, R.M.A., Sanden, van de, M.C.M., Schram, D.C.

Publikováno v: Proceedings 9th international colloquium on plasma processes, June 6-11, 1993, Antibes, Juan-les-Pins, France: papers, 99-101
STARTPAGE=99;ENDPAGE=101;TITLE=Proceedings 9th international colloquium on plasma processes, June 6-11, 1993, Antibes, Juan-les-Pins, France

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::997746ec00e3a67dd7761632787fd038
https://research.tue.nl/nl/publications/2de57c69-6df0-45e4-b4e0-4728ddcc4a98