Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Douglas R. Ritchie"'
Autor:
Steve D. Slonaker, Douglas R. Ritchie, Barton A. Katz, James S. Greeneich, Richard Rogoff, Stefan Wittekoek, Martin A. van den Brink, Paul Frank Luehrmann
Publikováno v:
SPIE Proceedings.
Many lithographic approaches to achieving 0.35 micron IC design rules have been proposed. Several years ago, the primary candidate was x-ray lithography. Today it is generally acknowledged that an optical approach will be used for such design rules.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d4a76a02de5c11157fe312e90f1116f
https://doi.org/10.1117/12.130363
https://doi.org/10.1117/12.130363
Autor:
Veerle Van Driessche, Luc Van den Hove, Patrick Jaenen, Nandasiri Samarakone, Paul Frank Luehrmann, Douglas R. Ritchie
Publikováno v:
SPIE Proceedings.
Shipley XP-89131 is a wet developable negative tone DUV resist, capable of resolving features down to 0.3 micrometers when used in conjunction with the ASM- L PAS 5000/70 stepper (NA equals 0.42). Practical implementation of this material at the limi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c7cefa352ca56cc4e342295b8e1cbe7
https://doi.org/10.1117/12.44771
https://doi.org/10.1117/12.44771
Autor:
J. W.D. Martens, Judon M. D. Stoeldraijer, Stefan Wittekoek, H. F. D. Linders, Douglas R. Ritchie, Martin A. van den Brink
Publikováno v:
Optical/Laser Microlithography III.
A new excimer laser stepper at 248 nm wavelength Is described wilti an all quartz 5x reduction lens with NA 0. 42 and 21 . 2 mm field size. Design aspects and experimental data are reported. A key feature of the system is a ilL alignment system with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc974492f47bfa3bc059b26f11542c2d
https://doi.org/10.1117/12.20207
https://doi.org/10.1117/12.20207
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