Zobrazeno 1 - 10
of 99
pro vyhledávání: '"Douglas J. Resnick"'
Autor:
Douglas J. Resnick, Eric Panning
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21207a95709e8a5a066e1b3ba2a77e91
https://doi.org/10.1117/1.jmm.21.1.011001
https://doi.org/10.1117/1.jmm.21.1.011001
Autor:
Jin Choi, Douglas J. Resnick
Publikováno v:
Advanced Optical Technologies. 6:229-241
Imprint lithography has been shown to be a promising technique for the replication of nanoscale features. Jet and flash imprint lithography (J-FIL) [jet and flash imprint lithography and J-FIL are trademarks of Molecular Imprints, Inc.] involves the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a679eacefeb5dd0e428db782679c641d
https://doi.org/10.1515/aot-2017-0020
https://doi.org/10.1515/aot-2017-0020
Autor:
TOSHIYA ASANO, Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas J. Resnick
Publikováno v:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98819a1edecd7ebaf1516077df4150db
https://doi.org/10.1117/12.2532522
https://doi.org/10.1117/12.2532522
Autor:
Kiyohito Yamamoto, Yukio Takabayashi, Douglas J. Resnick, Toshiya Asano, Keita Sakai, Hiromi Hiura, Tomohiko Hayashi, Takehiko Iwanaga, Takahiro Nakayama
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Imprint lithography is an effective and well known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f98450bd07dfa4f1b3511d4d5c64cd2d
https://doi.org/10.1117/12.2514925
https://doi.org/10.1117/12.2514925
Autor:
Junji Iwasa, Douglas J. Resnick
Publikováno v:
Photomask Technology 2018.
Over the last several decades, several innovative lithographic approaches have been introduced in an effort to extend device roadmaps for both memory and logic devices. For many years, the emphasis was almost strictly on resolution, with the thought
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdd5366385ae78c1620ade58749baf65
https://doi.org/10.1117/12.2502757
https://doi.org/10.1117/12.2502757
Autor:
Douglas J. Resnick, Shrawan Singhal, Michelle M. Grigas, Sidlgata V. Sreenivasan, Niyaz Khusnatdinov
Publikováno v:
Photomask Technology.
Nanoimprint lithography manufacturing utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ebdc257ac6196ab227c6500d77b74785
https://doi.org/10.1117/12.2280311
https://doi.org/10.1117/12.2280311
Autor:
Jerry Chen, Zhengmao Ye, Fred Alokozai, Brennan Milligan, Gary Doyle, Dwayne L. LaBrake, Douglas J. Resnick, Niyaz Khusnatdinov
Publikováno v:
SPIE Proceedings.
Pattern transfer is critical to any lithographic technology, and plays a significant role in defining the critical features in a device layer. As both the memory and logic roadmaps continue to advance, greater importance is placed on the scheme used
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b7eddd2bc2c8e389c654ec3c42e7342
https://doi.org/10.1117/12.2260455
https://doi.org/10.1117/12.2260455
Publikováno v:
Microelectronic Engineering. 86:709-713
Step and Flash Imprint Lithography (S-FIL^(R)) is a unique method that has been designed from the beginning to enable precise overlay for creating multi-level devices. However, since the technology is 1X, it is critical to address the infrastructure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f84b095147a50bcf02b8f8019d5c468d
https://doi.org/10.1016/j.mee.2008.11.071
https://doi.org/10.1016/j.mee.2008.11.071
Autor:
Yuko Sakai, Joseph Perez, Akjko Fujii, Ecron Thompson, Kosta Selinidis, John G. Maltabes, Douglas J. Resnick, Sidlgata V. Sreenivasan, Gerard M. Schmid, Shiho Sasaki, Naoya Hayashi, Nick Stacey
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2410-2415
Imprint lithography has been included on the ITRS lithography roadmap at the 32, 22, and 16nm nodes. Step and flash imprint lithography (S-FIL®) is a unique method that has been designed from the beginning to enable precise overlay for creating mult
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e83a24c1c39c6e560d452d877d2d04d
https://doi.org/10.1116/1.2976573
https://doi.org/10.1116/1.2976573
Autor:
Niyaz Khusnatdinov, Dwayne L. LaBrake, E. Sikorski, R. S. Shenoy, Cynthia B. Brooks, Ying Zhang, Kailash Gopalakrishnan, Arnie Ford, Gerard M. Schmid, Douglas J. Resnick, Ron Jih, Jordan Owens, Mary Beth Rothwell, Mark W. Hart
Publikováno v:
Microelectronic Engineering. 85:856-860
Optical lithography has been successful in achieving deep sub-wavelength images by the continuous improvement of lens systems, resists and the introduction of phase shift masks. One of the key challenges in attempting to pattern feature sizes less th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd3736a9fbfaa9ad14e0c6c08fe8ad32
https://doi.org/10.1016/j.mee.2008.01.041
https://doi.org/10.1016/j.mee.2008.01.041