Contributors

Autor: Mark F. Abel, Elaine Owen, Daniel Acker, Tamara A. Alexander, Alan P. Alfano, Omkar Baxi, Tanya Berenz, Roy Bowers, Jonathan N. Brantley, Josephine R. Bundoc, William E. Carter, John Chae, Lynette Codamon, Bill Contoyannis, Benjamin J. Darter, Katherine L. Dec, David Drake, Christopher C. Duncan, John S. Early, Joan Edelstein, Steven R. Edgley, Jason Edinger, Alberto Esquenazi, Deanna Fish, Mark Fisher, Benjamin D. Fortson, John R. Fox, David R. Gater, Lance L. Goetz, Gregory Jason Golladay, Ashraf S. Gorgey, Erik Hansen, Anne Hegberg, Joan Hou, Christopher Hovorka, Jared Howell, Timothy Hudson, Marjorie Johnson Hilliard, Brian M. Kelly, Shannon M. Kelly, Kevin L. Kilgore, Kevin M. King, Jayme S. Knutson, Gary J. Kroll, Michael Kwasniewski, Loren L. Latta, Timothy D. Lavis, Rondy Michael Lazaro, Dulcey Lima, Anthony Lin, Sheldon Lin, William Lovegreen, Christopher D. Lunsford, Thomas R. Lunsford, Nathaniel Makowski, Earnest P.S. Mawusi, Barry Meadows, Miguel N. Mojica, Jeffrey Bulaong Montes, Maximilian Munoz, Douglas P. Murphy, Leif M. Nelson, Tom F. Novacheck, Melissa Oliver, Ajit B. Pai, Preeti Panchang, Dawne Pound, Sara N. Raiser, Aaron Rasmussen, Doug Reber, Reynaldo R. Rey-Matias, Christopher A. Robinson, Olivier Y. Rolin, Natasha Romanoski, Augusto Sarmiento, Shannon Schultz, Weibin Shi, Amit Sinha, Marcus J. Smith, Amy Strouse, Seth K. Stubblefield, Ryan Sumrell, Terry J. Supan, Mukul Talaty, Laura L. Tosi, Daniel Tsukanov, Jeffrey T. Tubbs, Joseph B. Webster, Justin L. Weppner, Tiffany Williams, Ann Yamane, Michael Yeranosian, Kristin D. Zhao

Publikováno v: Atlas of Orthoses and Assistive Devices ISBN: 9780323483230

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::dddfe047f39f827277aeadd386dbddf2
https://doi.org/10.1016/b978-0-323-48323-0.00077-9

Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

Autor: Richard Johannes Franciscus Van Haren, Rob Morton, Henry Megens, Paul Christiaan Hinnen, Kevin E. Cooper, Clyde Browning, Jerome Depre, Ramon Navarro, Scott Warrick, Pierre-Olivier Sassoulas, Doug Reber

Publikováno v: Optical Microlithography XVIII.

In this paper, methods for stacking ASML scribe lane alignment marks (SPM) and improving the mark performance at initial copper metal levels are discussed. The new mark designs and the theoretical reasons for mark design and/or integration change are

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::48aa27bfc71782b7a1c69a59d40dcd3a
https://doi.org/10.1117/12.599807