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pro vyhledávání: '"Doug Bommarito"'
Autor:
Bob Patterson, Mark William Barrick, Karey L. Holland, Timothy J. Wiltshire, Katherine C. Norris, Joseph C. Vigil, Doug Bommarito, Yumiko Takamori
Publikováno v:
SPIE Proceedings.
The Micrascan II is a 0.50 NA DUV, broadband illumination (245 nm to 252 nm) step-and- scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The tool has been designed to provide 350 nm res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::853a2508ea61ccc95b777684688f85c9
https://doi.org/10.1117/12.150455
https://doi.org/10.1117/12.150455
