Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Doron Greental"'
Autor:
Shubham Babbar, Vijay Garika, Soumadri Samanta, Shankar Bhattarai, Sumesh Sadhujan, Sherina Harilal, Evgeny Pikhay, Ruth Shima‐Edelstein, Doron Greental, Avital Eisenberg‐Lerner, Ziv Rotfogel, Muhammad Y. Bashouti, Barak Akabayov, Izhar Ron, Yakov Roizin, Offer Erez, Gil Shalev
Publikováno v:
Advanced Electronic Materials, Vol 10, Iss 6, Pp n/a-n/a (2024)
Abstract The sensing of small molecules is important to a variety of fields and particularly to clinical diagnostics. Estriol is an important small chemical molecule, as it is one of three markers measured during mid‐gestation for the Down syndrome
Externí odkaz:
https://doaj.org/article/f8fa186785714cdfa8ba770cc9e55641
Autor:
Soumadri Samanta, Ie Mei Bhattacharyya, Ashish Prajapati, Izhar Ron, Ruth Shima‐Edelstein, Evgeny Pikhay, Doron Greental, Avital Eisenberg‐Lerner, Ziv Rotfogel, Yakov Roizin, Barak Akabayov, Gil Shalev
Publikováno v:
Advanced Materials Technologies.
Autor:
Ie Mei Bhattacharyya, Izhar Ron, Ankit Chauhan, Evgeny Pikhay, Doron Greental, Niv Mizrahi, Yakov Roizin, Gil Shalev
Publikováno v:
Nanoscale. 14:2837-2847
A Meta-Nano Channel BioFET is demonstrated to decouple the electrostatics of the solution from the electrodynamics of the FET such that the Debye screening length can be electrostatically tuned to enhance the sensor output signal.
Autor:
Izhar Ron, Ie Mei Bhattacharyya, Vinay Shankar Tiwari, Doron Greental, Ruth Shima-Edelstein, Evgeny Pikhay, Yakov Roizin, Barak Akabayov, Gil Shalev
Publikováno v:
SSRN Electronic Journal.
Autor:
Soumadri Samanta, Ie Mei Bhattacharyya, Ashish Prajapati, Izhar Ron, Ruth Shima-Edelstein, Evgeny Pikhay, Doron Greental, Avital Eisenberg-Lerner, Ziv Rotfogel, Yakov Roizin, Gil Shalev
Publikováno v:
SSRN Electronic Journal.
Autor:
Noa Mazurski, O. Ternyak, Gil Atar, Doron Greental, Ariel Bruner, Shlomo Ruschin, Yehoudit Elbaz, B. Sfez, Shifra Gouta, Galina Chechelnitsky, David Eger
Publikováno v:
Optical Materials. 38:265-271
A deep inductively coupled plasma etching process was developed as a part of a continuous effort to develop an all-silica on-chip platform for high-power optical devices. Combined F and Cl based etching chemistry was found most suitable since silica