Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Dong-Hyeuk Choi"'
Publikováno v:
Nanomaterials, Vol 12, Iss 23, p 4342 (2022)
In this study, a silicon carbon nitride (SiCN) thin film was grown with a thickness of 5~70 nm by the plasma-enhanced chemical vapor deposition (PECVD) method, and the oxygen permeation characteristics were analyzed according to the partial pressure
Externí odkaz:
https://doaj.org/article/a824335723864eb4af702a8561faba86
Autor:
Woon-San Ko, Myeong Ho Song, Ki-Nam Kim, Jun-Ho Byun, Do-Yeon Lee, Eun-gi Kim, Eun-A Koo, So-Yeon Kwon, Geun-Ho Kim, Dong-Hyeuk Choi, Ga-Won Lee
Publikováno v:
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).