Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Dong-Hak Lee"'
Publikováno v:
The Journal of Korean Institute of Electromagnetic Engineering and Science. 30:780-783
Publikováno v:
Sustainability
Volume 13
Issue 6
Sustainability, Vol 13, Iss 3141, p 3141 (2021)
Volume 13
Issue 6
Sustainability, Vol 13, Iss 3141, p 3141 (2021)
Street tree species are selected mainly based on functional utility. This selection practice results in effective management. If the value of street trees as perceived by citizens is added to the existing selection criteria, satisfaction will be impr
Autor:
Seung-Woo Koo, Jung-Il Hwang, Hyun-Sok Kim, Rizvi Rahman, Kwang-Young Hu, Dong-Jin Lee, Min-Shik Kim, Raheleh Pishkari, In-Ho Joo, Dong-Hak Lee, Jae-Wuk Ju, Allwyn Boustheen, Ik-Hyun Jeong, Marc Hauptmann, Paul Böcker, Kang-San Lee, Kang-Min Lee, Cees Lambregts, Young-Sik Kim
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
In advanced DRAM semiconductor manufacturing, there is a need to reduce the overlay fingerprints. Reducing on device fingerprints with very high spatial frequency remains one of the bottlenecks to achieve sub-2nm on device overlay. After-etch device
Autor:
Dong Hak Lee, Doo-Yeong Yang
Publikováno v:
Journal of Knowledge Information Technology and Systems. 13:487-498
Autor:
Dong Hak Lee, Doo-Yeong Yang
Publikováno v:
Journal of Knowledge Information Technology and Systems. 12:501-511
Autor:
Doo-Yeong Yang, Dong Hak Lee
Publikováno v:
Journal of Knowledge Information Technology and Systems. 12:581-590
Autor:
Doo-Yeong Yang, Dong Hak Lee
Publikováno v:
Journal of Knowledge Information Technology and Systems. 12:571-580
Autor:
Jun-Yeob Kim, Dongyoung Lee, Sangjun Han, Aileen Soco, Nang-Lyeom Oh, Chanha Park, Tjitte Nooitgedagt, Dong-Hak Lee, Arno van Leest, Honggoo Lee, Jaap Karssenberg, Mir Shahrjerdy
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
In next generation 3D-NAND devices, accurately determining after-etch overlay for the multi-layer stack is a major challenge. This is especially the case for the multi-tier 3D-NAND structures, where the overlay of the channel holes is an important pe
Publikováno v:
The Journal of Korean Institute of Communications and Information Sciences. 41:789-798
Autor:
Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Karssenberg, Jaap, Shahrjerdy, Mir, van Leest, Arno, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-8, 8p