Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Dong Hun Yu"'
Autor:
Hyoungcheol Kwon, Imhee Won, Songhee Han, Dong-Hun Yu, Deuk-Chul Kwon, Yeon Ho Im, Felipe Iza, Dongyean Oh, Sung-Kye Park, Seonyong Cha
Publikováno v:
Physics of Plasmas. 29:093510
Vertical scaling technique faces a physical limitation in 3D NAND device fabrication, even assuming superior etching technology. Another promising scaling technique to increase the storage density is lateral scaling, which increases the number of hol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7849eb1c498b80d77abdf9759a9bdead
https://doi.org/10.1063/5.0101106
https://doi.org/10.1063/5.0101106
Publikováno v:
Journal of Physics D: Applied Physics. 55:415205
Although the ion temperature can considerably affect bulk plasma parameters and ion angle distribution functions arriving at the substrate, limited experiments have been conducted on this phenomenon because ion temperature measurement is difficult. F
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df8dff1bc34e596bf831bb3ba7386881
https://doi.org/10.1088/1361-6463/ac8689
https://doi.org/10.1088/1361-6463/ac8689
Autor:
Yeong Geun Yook, Hae Sung You, Jae Hyeong Park, Won Seok Chang, Deuk Chul Kwon, Jung Sik Yoon, Kook Hyun Yoon, Sung Sik Shin, Dong Hun Yu, Yeon Ho Im
Publikováno v:
Journal of Physics D: Applied Physics. 55:255202
We present a topographic simulation platform that simultaneously considers 3D surface movement, neutral and ion transport, and surface reactions in plasma high-aspect-ratio (HAR) oxide etching. The hash map data structure is considered for an effecti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::811f7ea597ec3f47832b3a162efeca4b
https://doi.org/10.1088/1361-6463/ac58cf
https://doi.org/10.1088/1361-6463/ac58cf
Publikováno v:
Journal of The Korean Society of Physical Medicine. 13:85-94
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::636a0ebb1bcc19e3799d98bed73559d0
https://doi.org/10.13066/kspm.2018.13.4.85
https://doi.org/10.13066/kspm.2018.13.4.85
Publikováno v:
Computer Physics Communications. 219:297-302
In order to reduce the computing time in simulation of radio frequency (rf) plasma sources, various numerical schemes were developed. It is well known that the upwind, exponential, and power-law schemes can efficiently overcome the limitation on the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0e0a2283a617f7e471cfe568f472e378
https://doi.org/10.1016/j.cpc.2017.06.006
https://doi.org/10.1016/j.cpc.2017.06.006
Publikováno v:
Current Applied Physics. 16:644-650
In order to overcome limitations on the simulation time step for fluid transport simulations of high density plasma discharges, the dielectric relaxation scheme (DRS) was developed. By imitating a realistic and physical shielding process of electric
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c153fbe426c4058ffcd9794c6a9f11e
https://doi.org/10.1016/j.cap.2016.03.015
https://doi.org/10.1016/j.cap.2016.03.015
Autor:
Jae Hyeong Park, Deuk Chul Kwon, Yeong Geun Yook, Hae Sung You, Sung-Kye Park, Dong Hun Yu, Jung Sik Yoon, Min Ju Oh, Yeon-Ho Im, Won-Seok Chang, Hyoung Chul Kwon
Publikováno v:
Journal of Physics D: Applied Physics. 53:385207
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28e2602adb7bc65f0703666933d71988
https://doi.org/10.1088/1361-6463/ab9572
https://doi.org/10.1088/1361-6463/ab9572
Publikováno v:
Physics of Plasmas. 27:073507
The volume-averaged global plasma model has been widely used to analyze the characteristics of plasma, although the spatial variation of plasma parameters cannot be obtained from it. It has also been used to obtain temporal plasma parameters for puls
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cc8421955629dda715157a1d312cd6c
https://doi.org/10.1063/5.0006505
https://doi.org/10.1063/5.0006505
Autor:
Mi Young Song, Jae Hyeong Park, Shin-Jae You, Dae Woong Kim, Yeong Geun Yook, Won-Seok Chang, Yeon-Ho Im, Hyoungcheol Kwon, Sung Kye Park, Jung Sik Yoon, Hae Sung You, Deuk Chul Kwon, Dong Hun Yu
Publikováno v:
Applied Surface Science. 515:145975
We propose a semi-global surface reaction model to capture simultaneous polymer deposition and oxide etching in fluorocarbon plasma. The critical parameters of this model within reasonable ranges can be determined using predesigned experimental data
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b97074f07de0ea9b655e83b8c543301
https://doi.org/10.1016/j.apsusc.2020.145975
https://doi.org/10.1016/j.apsusc.2020.145975
Publikováno v:
2018 IEEE International Conference on Plasma Science (ICOPS).
The volume-averaged global plasma model has been widely used to obtain spatially averaged plasma parameters on geometry or process parameters such as applied power, pressure, and gas flow. The characteristics of the plasma are determined by the parti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7cc4ca0d52cb3319cd188b0ef1960049
https://doi.org/10.1109/icops35962.2018.9575421
https://doi.org/10.1109/icops35962.2018.9575421