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pro vyhledávání: '"Dong Hoon Paul Chung"'
Autor:
Norio Fukui, Gerard Luk-Pat, Motonari Tateno, Kenichi Matsumura, Katsumi Ohira, Yoshio Tanaka, Jiunn-Hung Chen, Yoshioka Nobuyuki, Dong Hoon Paul Chung
Publikováno v:
SPIE Proceedings.
As 90 nm LSI devices are about to enter pre-production, the cost and turn-around time of photomasks for such devices will be key factors for success in device production. Such devices will be manufactured with state-of-the-art 193nm photolithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5111224dff0a1531252b5c059e41dfb6
https://doi.org/10.1117/12.557734
https://doi.org/10.1117/12.557734
