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Publikováno v:
Extreme Ultraviolet Lithography.
A three-element Köhler condenser system has been fabricated, characterized, and integrated into an EUV lithographic system. The multilayer coatings deposited on the optics were designed to provide optimal radiation transport efficiency and illuminat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2ffbed8a0574c6421cd0c55a8aa1df1
https://doi.org/10.1364/eul.1994.ec.41
https://doi.org/10.1364/eul.1994.ec.41
