Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Don E. Yansen"'
Publikováno v:
SPIE Proceedings.
We present the results of a DARPA sponsored study on the application of Focused Ion Beam (FIB) systems to metrology in advanced lithography for production and process development. Data on top-down measurements, on the effects of FIB imaging, and on m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::616660589042f3c75f41688818a6363a
https://doi.org/10.1117/12.386504
https://doi.org/10.1117/12.386504
Autor:
Drew Barnes, Kathryn Noll, Gregory J. Athas, J. David Casey, Don E. Yansen, Neil J. Bassom, Jesse A. Salen
Publikováno v:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V.
We demonstrate an approach to cross-section and measure sub- 0.25 micrometer photoresist profiles in both a manual and an automated fashion. This approach includes the use of a focused ion beam (FIB) system to cut small trenches through photoresist l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59507c22d18db1067373d38da41b2592
https://doi.org/10.1117/12.361311
https://doi.org/10.1117/12.361311
Publikováno v:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV.
We present the ability of a focused ion beam system (FIB) to perform as an effective metrology tool. This feature is a benefit in areas where FIB technology is or can be used, or where pre-measurement cross-sectioning is required, such as the case in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd179c8e27d5b236bef9f0552e6f8d0f
https://doi.org/10.1117/12.324349
https://doi.org/10.1117/12.324349
Autor:
Frank F. Wenners, Russell Mello, Don E. Yansen, Tuan Ngo, Kathryn E. Noll, James P. Nadeau, Raymond R. Hill, Michael Siebers, Gregory J. Athas
Publikováno v:
SPIE Proceedings.
We have developed a focused ion beam (FIB) system for automated MEMS processing. This product, the Micrion MicroMill, has been successfully used in production and prototype milling of over three million thin film heads (TFH) used in hard disk drives.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2eb8d481ea2ef185aeea76cc43f5850e
https://doi.org/10.1117/12.284481
https://doi.org/10.1117/12.284481
Autor:
Don E. Yansen, Russell Mello, N. J. Guarino, S. Shenoy, David A. Townzen, R. W. DiNuccio, Mark D. Dimanna, J. David Casey, Alex F. Pless, G. Onorio
Publikováno v:
SPIE Proceedings.
Inspection and repair offer higher yields and lower costs for AMLCDs, plasma displays and field emission displays, especially as display size increases. For repair to contribute, it must be fast and fully reliable. Building on L1 technology, a second
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83f3b2b156ce6968a35c769e665e32e4
https://doi.org/10.1117/12.207517
https://doi.org/10.1117/12.207517
Autor:
Bhanwar Singh, Don E. Yansen, Hans R Rottmann, Laurie J. Lauchlan, William Mark Hiatt, Mark A. Seliger, Lynda Clark Hannemann-Mantalas, Marylyn Hoy Bennett
Publikováno v:
SPIE Proceedings.
A wafer metrology 'round robin' has been completed comparing linewidth measurements from several different companies and different measurement tools and technologies. The project has been conducted under the auspices of SEMI by members of SEMI's Metr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b3bac53549e5b1c3e2a6cf297cefd58
https://doi.org/10.1117/12.44472
https://doi.org/10.1117/12.44472
Autor:
Hans Bengtsson, Don E. Yansen
Publikováno v:
SPIE Proceedings.
Is there enough contrast under white light illumination to perform automated metrology on latent or undeveloped photoresist images for control of the lithographic process? This would be an interesting option for the next generation photolithograpy ce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5bd724ad4c96b8aa93668daaff88d3c6
https://doi.org/10.1117/12.20040
https://doi.org/10.1117/12.20040
Publikováno v:
SPIE Proceedings.
Recent studies show that white light, or broadband, metrology systems continue to be used as the "work-horse" method for measuring features at 1.0 micron and below in production manufacturing environments. With the advances in the area of broadband o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6406161543948289018106a1649ec9f
https://doi.org/10.1117/12.953107
https://doi.org/10.1117/12.953107
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