Zobrazeno 1 - 10
of 67
pro vyhledávání: '"Dominique Débarre"'
Publikováno v:
Semiconductor Science and Technology. 38:034003
We report on the structural properties of highly B-doped silicon (up to 10 at.% of active doping) realised by nanosecond laser doping. The crystalline quality, lattice deformation and B distribution profile of the doped layer are investigated by scan
Autor:
Dominique Débarre, L. Barast, Alexei D. Chepelianskii, Sam L. Bayliss, F. Chiodi, Richard H. Friend, Hélène Bouchiat
Publikováno v:
Nature Communications
Nature Communications, Nature Publishing Group, 2018, 9 (1), ⟨10.1038/s41467-017-02804-6⟩
Nature Communications, Vol 9, Iss 1, Pp 1-7 (2018)
Nature Communications, Nature Publishing Group, 2018, 9 (1), ⟨10.1038/s41467-017-02804-6⟩
Nature Communications, Vol 9, Iss 1, Pp 1-7 (2018)
In weakly spin–orbit coupled materials, the spin-selective nature of recombination can give rise to large magnetic-field effects, e.g. on the electro-luminescence of molecular semiconductors. Although silicon has weak spin–orbit coupling, observi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dcc61653958d1ecb17bd8ab7bfa874af
https://hal.archives-ouvertes.fr/hal-02399933
https://hal.archives-ouvertes.fr/hal-02399933
Publikováno v:
Physical Review B: Condensed Matter and Materials Physics (1998-2015)
Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2017, 96 (2), ⟨10.1103/PhysRevB.96.024503⟩
Physical Review B: Condensed Matter and Materials Physics (1998-2015), American Physical Society, 2017, 96 (2), ⟨10.1103/PhysRevB.96.024503⟩
Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2017, 96 (2), ⟨10.1103/PhysRevB.96.024503⟩
Physical Review B: Condensed Matter and Materials Physics (1998-2015), American Physical Society, 2017, 96 (2), ⟨10.1103/PhysRevB.96.024503⟩
We have realized laser-doped all-silicon superconducting (S)/normal metal (N) bilayers of tunable thickness and dopant concentration. We observed a strong reduction of the bilayers' critical temperature when increasing the normal metal thickness, a s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6c6ff8183da8b5e1a7d5a14ca220ab8f
https://hal.science/hal-01986248
https://hal.science/hal-01986248
Autor:
Dominique Débarre, Thierry Klein, F. Chiodi, Christophe Marcenat, J. E. Duvauchelle, Audrey Grockowiak, Frédéric Fossard, F. Lefloch
Publikováno v:
Applied Surface Science
Applied Surface Science, Elsevier, 2014, 302, pp.209-212. ⟨10.1016/j.apsusc.2013.10.101⟩
Applied Surface Science, 2014, 302, pp.209-212. ⟨10.1016/j.apsusc.2013.10.101⟩
Applied Surface Science, Elsevier, 2014, 302, pp.209-212. ⟨10.1016/j.apsusc.2013.10.101⟩
Applied Surface Science, 2014, 302, pp.209-212. ⟨10.1016/j.apsusc.2013.10.101⟩
We have conceived and fabricated Superconductor/Normal metal/Superconductor Josephson junctions made entirely of boron doped Silicon. We have used Gas Immersion Laser Doping to fabricate SN bilayers with good ohmic interfaces and well controlled conc
Publikováno v:
Applied Surface Science. 258:9228-9232
We have probed the dopant activity of silicon B-doped by Gas Immersion Laser Doping (GILD). Here, we report on the comparison of optical, electrical and structural properties of Si:B, over a wide concentration range, up to 1.5 × 10 21 cm −3 by ste
Publikováno v:
physica status solidi c. 8:915-918
We report on the synthesis of SiGe layers on silicon by using a pulsed laser processing technique (Gas Immersion Laser Doping) where GeCl4 gas molecules are adsorbed on the surface and further incorporated into the Si top layer by a pulsed laser indu
Autor:
Davide Cammilleri, Daniel Bouchier, C. Tran Manh, Dominique Débarre, N. Yam, Frédéric Fossard, Mathieu Halbwax, Jacques Boulmer
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2008, 517, pp.327-330. ⟨10.1016/j.tsf.2008.08.147⟩
Thin Solid Films, 2008, 517, pp.327-330. ⟨10.1016/j.tsf.2008.08.147⟩
Thin Solid Films, Elsevier, 2008, 517, pp.327-330. ⟨10.1016/j.tsf.2008.08.147⟩
Thin Solid Films, 2008, 517, pp.327-330. ⟨10.1016/j.tsf.2008.08.147⟩
The use of Ge nanostructures in microelectronic devices requires quite low thermal budget processes. In this paper, we report on the development of a technique which enables the localization of laser thermal annealing. Dielectric layers have been dep
Publikováno v:
Superlattices and Microstructures. 44:348-353
We used in situ reflection high energy electron diffraction and ex situ atomic force microscopy to study the selective epitaxial growth of Si structures on partially desorbed SiO 2 /Si surfaces. The low temperature desorption of the oxide layer resul
Autor:
Klaus Hasselbach, Dominique Débarre, J. E. Duvauchelle, Christophe Marcenat, John R. Kirtley, F. Chiodi, Anaïs Francheteau, F. Lefloch
Publikováno v:
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2015, 107 (7), pp.072601. ⟨10.1063/1.4928660⟩
Applied Physics Letters, 2015, 107 (7), pp.072601. ⟨10.1063/1.4928660⟩
Applied Physics Letters, American Institute of Physics, 2015, 107 (7), pp.072601. ⟨10.1063/1.4928660⟩
Applied Physics Letters, 2015, 107 (7), pp.072601. ⟨10.1063/1.4928660⟩
We have studied a Superconducting Quantum Interference SQUID device made from a single layer thin film of superconducting silicon. The superconducting layer is obtained by heavily doping a silicon wafer with boron atoms using the Gas Immersion Laser
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d34663126299a04192a8b844e3e280da
https://hal.archives-ouvertes.fr/hal-01590246
https://hal.archives-ouvertes.fr/hal-01590246
Publikováno v:
Journal de Physique IV (Proceedings). 138:203-212
Les procedes de recuit et de dopage laser du silicium ont ete etudies de maniere intensive au cours des precedentes decennies. Ces etudes ont d'ores et deja permis un transfert technologique pour la fabrication des semiconducteurs. Cependant les futu