Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Dominik Treiblmayr"'
Autor:
Joao L G Ferreira, Dominik Treiblmayr, Martin Eibelhuber, David Pearson, Christine Thanner, Sebastien Pochon, Stephanie Baclet, W. Frost
Publikováno v:
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) II.
Augmented reality glassed based on waveguides with diffraction gratings are the technology of choice for many device makers. They have evolved to provide excellent picture quality and large field of view to the users. However, the field of view is a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad985e3b1b50837930c22433a10d352e
https://doi.org/10.1117/12.2579505
https://doi.org/10.1117/12.2579505
Autor:
Dominik Treiblmayr, Michael Jurisch, Stephan Martens, Julian Hartbaum, G. Berger, Martin Eibelhuber, Mustapha Chouiki, Christine Thanner, Anna Dudus
Publikováno v:
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR).
Wafer-level nanoimprint lithography (NIL) has increasingly become a key enabling technology to support new devices and applications across a wide range of markets. Leading manufacturers of augmented reality (AR) devices, optical sensors and biomedica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b282bc000deec0153fa8675e5b5d863a
https://doi.org/10.1117/12.2543692
https://doi.org/10.1117/12.2543692
Autor:
Dominik Treiblmayr, Barbara Schamberger, Mathias Holz, Alexander Reum, Jean-Francois de Marneffe, Thomas Glinsner, Ahmad Ahmad, Martin Eibelhuber, Ziad el Otell, Martin Hofmann, Yana Krivoshapkina, Boon Teik Chan, Tzvetan Ivanov, Steve Lenk, Claudia Lenk, Mustapha Chouiki, Ivo W. Rangelow
Publikováno v:
Journal of Vacuum Science & Technology B. 37:021603
Next generation electronic devices like single electron transistors (SETs) operating at room temperature (RT) demand for high-resolution patterning techniques and simultaneously cost-effective, high-throughput manufacturing. Thereby, field-emission s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c58ff50cf7ebb5bffd916e2f9c1f788e
https://doi.org/10.1116/1.5067269
https://doi.org/10.1116/1.5067269
Autor:
Dominik Treiblmayr, Elmar Platzgummer, Thomas Fromherz, Michael Muehlberger, Elisabeth Lausecker, T. Narzt, Stefan Eder-Kapl, Rainer Schoeftner, R. Miller, Iris Bergmair, Michael Kast, Gerald Kreindl, P. Joechl, Hans Loeschner, M. Boehm, Mustapha Chouiki, Thomas Glinsner
Publikováno v:
Microelectronic Engineering. 88:2070-2073
The use of working stamps for nanoimprint lithography is highly interesting due to a number of reasons. We present results of such a master stamp - working stamp - imprint process where we achieved a resolution of 12.5nm half pitch. To fabricate mast
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ed3709d4ac5bc594d79da3bfa916dce
https://doi.org/10.1016/j.mee.2010.12.110
https://doi.org/10.1016/j.mee.2010.12.110
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:C6M57-C6M62
Herein, the authors demonstrate the use of step-and-repeat nanoimprint lithography for the fabrication of wafer level lens master. Thereby, the authors will focus on so far unmet needs in regard to lateral lens to lens positioning, residual layer uni
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74ffa8a71ea005196e2e2d875d3e01da
https://doi.org/10.1116/1.3518914
https://doi.org/10.1116/1.3518914