Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Domenico A. DiPaola"'
Autor:
Domenico A. DiPaola, Nelson Felix, R. Johnson, Chi-Chun Liu, Daniel Corliss, Luciana Meli, Cheng Chi, Takuya Kuroda, Jing Guo, Yann Mignot, Harumoto Masahiko, Dustin W. Janes, Yuji Tanaka
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Lithographic and pitch-multiplying spacer technologies are widely used to shrink interconnect periodicity within critical layers. This places significant burden on overlay and CD uniformity of the subsequently patterned vias to physically contact and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ece1618b77be3d02874f9af91f4baa8a
https://doi.org/10.1117/12.2515153
https://doi.org/10.1117/12.2515153
Autor:
Ian Stobert, Domenico A. Dipaola
Publikováno v:
Photomask Technology 2008.
Models Based Optical Proximity Correction (MBOPC) is used extensively in the semiconductor industry to achieve robust pattern fidelity in modern lithographic processes. Much of the complexity in OPC algorithms is handled by advanced commercial softwa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff7a2454feda8dc16aaa288effc77402
https://doi.org/10.1117/12.801551
https://doi.org/10.1117/12.801551