Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Dojun Kim"'
Autor:
Yong-Min Choi, Dojun Kim
Publikováno v:
The Journal of Humanities and Social sciences 21. 11:45-60
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2798fe778929918e78afc43f9b0cfd59
https://doi.org/10.22143/hss21.11.2.4
https://doi.org/10.22143/hss21.11.2.4
Autor:
Hakan Usta, Yunus Zorlu, Resul Ozdemir, Kyunghan Ahn, Dojun Kim, İbrahim Deneme, Myung-Gil Kim
Publikováno v:
Journal of Materials Chemistry C. 8:15253-15267
Diacene-fused thienothiophenes (DAcTTs) have provided an excellent pi-framework for the development of high mobility p-type molecular semiconductors in the past decade. However, n-type DAcTTs are rare and their electron transport characteristics rema
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::67eb41b1b3f7a7ff9cd7a8fa1090142d
https://doi.org/10.1039/d0tc02945a
https://doi.org/10.1039/d0tc02945a
Publikováno v:
Journal of Korean Society for Imaging Science and Technology. 24:9-16
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83c68ee72097dc084bde2f29b1b3307e
https://doi.org/10.14226/ksist.2018.24.02.2
https://doi.org/10.14226/ksist.2018.24.02.2
Autor:
Sophia Z. Habibi, Mohammad Ehsan, Jürgen Koller, Oh Hyun Kim, Timothy J. Anderson, John R. Eyler, Jooyoung Lee, Dan R. Denomme, Dojun Kim, Lisa McElwee-White
Publikováno v:
Journal of The Electrochemical Society. 159:H545-H553
The thermal decomposition pathways of the tungsten dimethylhydrazido complexes Cl4(RCN)W(NNMe2) (1a: R=CH3; 1b: R=Ph), precursors for single source deposition of WNxCy, were investigated using a combination of experiments and calculations. Raman scat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c81bd8dc8203bc7bf877b814431260e
https://doi.org/10.1149/2.002206jes
https://doi.org/10.1149/2.002206jes
Autor:
Joo Young Lee, Lisa McElwee-White, Sophia Z. Habibi, Dojun Kim, Oh Hyun Kim, Jürgen Koller, Dan R. Denomme, Timothy J. Anderson
Publikováno v:
ECS Transactions. 28:15-26
The gas-phase decomposition pathways of the tungsten dimethylhydrazido complexes Cl4(RCN)W(NNMe2) (1a: R = CH3; 1b: R = Ph), precursors for single source deposition of WNxCy, were investigated using a combination of experiments and calculations. Rama
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9948b610ce7304908305d58545da5382
https://doi.org/10.1149/1.3490279
https://doi.org/10.1149/1.3490279
Autor:
Oh Hyun Kim, Hiral M. Ajmera, Jürgen Koller, Lisa McElwee-White, Dojun Kim, Timothy J. Anderson
Publikováno v:
ECS Transactions. 25:541-548
The tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip) (1) was used as a single-source precursor for film growth of tungsten carbonitride (WNxCy) by metal-organic chemical vapor deposition (CVD) in H2 carrier. Multiple spectroscopic techniques we
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e3af2645b9649aaf346d1796ca3b4bc
https://doi.org/10.1149/1.3207637
https://doi.org/10.1149/1.3207637
Autor:
Jürgen Koller, Lisa McElwee-White, Oh Hyun Kim, Timothy J. Anderson, Lii-Cherng P. Leu, Dojun Kim, David P. Norton, Joseph M. Tsai
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:943-950
The tungsten piperidylhydrazido complex Cl4(CH3CN)W(N-pip) (1) was used for film growth of tungsten carbonitride (WNxCy) by metal-organic chemical vapor deposition (CVD) in the absence and presence of ammonia (NH3) in H2 carrier. The microstructure o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81ee520e0e3d58ea925955174049571c
https://doi.org/10.1116/1.3106625
https://doi.org/10.1116/1.3106625
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:923-928
GaN films were grown on Si(100) substrate by atomic layer deposition (ALD) using GaCl3 and NH3. Growth conditions were identified for which the growth rate exhibited a plateau at ∼2.0A∕cycle, consistent with self-limiting adsorption. A relatively
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b834a30f716aa920a9edba573a699e5b
https://doi.org/10.1116/1.3106619
https://doi.org/10.1116/1.3106619
Autor:
Oh Hyun Kim, Dojun Kim, Khalil A. Abboud, Jürgen Koller, Timothy J. Anderson, Lisa McElwee-White, Hiral M. Ajmera
Publikováno v:
Journal of The Electrochemical Society. 158:H618
The tungsten piperidylhydrazido complex Cl 4 (CH 3 CN)W(N-pip) (1) was used as a single-source precursor for film growth of tungsten carbonitride (WN x Cy) by metal-organic chemical vapor deposition (CVD) in H 2 carrier. Multiple spectroscopic techni
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1436e7b2e4eb4e51cb80f14d7efa2d60
https://doi.org/10.1149/1.3561669
https://doi.org/10.1149/1.3561669
Publikováno v:
ECS Meeting Abstracts. :1124-1124
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2c179f11066e151b7e0446e0c26be748
https://doi.org/10.1149/ma2010-01/21/1124
https://doi.org/10.1149/ma2010-01/21/1124