Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Dobrynya V. Kolodko"'
Publikováno v:
Plasma Sources Science and Technology.
Arrival of highly energetic (near 1000 eV) positive atomic oxygen ions to the substrate region has been detected in a unipolar reactive HiPIMS process operated with uncooled copper target in argon–oxygen mixtures. Examination of ion fluxes from dis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8093852a6e8c0f493c4bf17836fac5ef
https://doi.org/10.1088/1361-6595/acda5b
https://doi.org/10.1088/1361-6595/acda5b
Autor:
Andrey V. Kaziev, Dobrynya V. Kolodko, Vladislav Yu. Lisenkov, Alexander V. Tumarkin, Maksim M. Kharkov, Nikolay N. Samotaev, Konstantin Yu. Oblov
Publikováno v:
Coatings; Volume 13; Issue 2; Pages: 238
We examined the feasibility of alumina substrate metallization by magnetron deposition of copper coatings with thickness of several tens µm for its prospective applications in production of ceramic PCBs and packaging. The films were prepared in magn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4e157bb99ec1ae38bb75b46338eb15bf
https://doi.org/10.3390/coatings13020238
https://doi.org/10.3390/coatings13020238
Autor:
Maksim V. Prozhega, Maksim M. Kharkov, Egor O. Reschikov, Georg I. Rykunov, Andrey V. Kaziev, Margarita S. Kukushkina, Dobrynya V. Kolodko, Tatiana V. Stepanova
Publikováno v:
Coatings; Volume 12; Issue 2; Pages: 125
We compared two modes of magnetron sputter deposition of MoS2 on substrates made of steel AISI 316L and bronze CuAl9NiFe4Mn1 with different initial roughness Ra 0.05–2.32 µm. The deposition was carried out at a bias voltage of −20 and +100 V, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::262297210dead43b70dcf414fee2bb5a
https://doi.org/10.3390/coatings12020125
https://doi.org/10.3390/coatings12020125